Used ULVAC EX-550-C10 #9078375 for sale

ULVAC EX-550-C10 is a high-performance plasma-enhanced chemical vapor deposition (PECVD) reactor designed to deposit a range of materials for a range of applications. The reactor features a simple, durable stainless steel chamber and full computer automation for ease of use, enabling high-quality, repeatable results. This reactor is equipped with a state-of-the-art electron cyclotron resonance (ECR) plume envelope for maximum uniformity, improved processing rate, and improved layer quality. The unique ECR configuration allows for a very homogeneous plasma source and a very controlled energetic environment, leading to stable nucleation of materials and better retention of material properties. The system can process wafers up to 5.7" in diameter at a maximum substrate temperature of 450°C. ULVAC EX 550-C10 features a comprehensive set of automated plasma diagnostics capabilities, including real-time plasma imaging and an on-board optical emission spectrometry (OES) system. This allows for comprehensive monitoring of plasma conditions to maximize process yields and improve layer quality. Additionally, GASBOX variable levels of backside gas introduction can further optimize the deposition rates. Other features of this reactor include a solid-state generator with advanced pulse control, automated chamber cleaning, and a film thickness monitor. This enables precise control of substrate heating and cooling, substrate movement, and provides repeatable processes. Overall, EX-550-C10 provides a cost-effective solution for deposition of high-quality films for numerous applications.