Used ULVAC EX-650-C16 #9111731 for sale

ULVAC EX-650-C16 is a highly advanced and precise high-vacuum thermal evaporation reactor. It is designed to deposit thin films of refractory metals and dielectrics with high accuracy and precision. EX-650-C16 is a single-stage UHV thermal evaporation equipment that is operated at pressures of 6 x 10-6 Pa or less. This reactor is equipped with precise deposition rate control systems, minimized gas contamination, and high throughput using a range of sample geometries. The reactor is ideal for multi-layer thin film coating applications such as OLEDs or MEMS, offering an easy to use method for achieving superior layer performance with extremely low levels of deposition-contamination. ULVAC EX-650-C16 utilizes a crucible-based evaporation method, which allows for higher deposition rates than with effusion cells. It also allows samples to be coated outside the vacuum chamber while still maintaining vacuum integrity with the use of an inlet port that the sample can be inserted into. The reactor has an accurate and consistent deposition rate of up to 20.0nm/min and an exceptional overall uniformity of ±1.6%. EX-650-C16 is equipped with multiple features to provide superior thin film results, including a contamination trap, purification filter, and efficient exhaust systems that reduce the risk of outgasing byproducts. The reactor is constructed with high-precision stainless steel with a PE coating for exceptional durability and longevity. It is also equipped with a unique LED lighting system for improved visibility of the working chamber in case of a power failure. ULVAC EX-650-C16 is a reliable, efficient, and cost-effective thermal evaporator that has been designed to meet the needs of research and development use in a variety of thin film applications. It is a precise, high-vacuum unit that is designed to deposit thin films with exceptional accuracy and uniformity. The advanced technology of the machine ensures consistent results with excellent repeatability and low levels of contamination. EX-650-C16 is an ideal solution for achieving superior thin film layers with minimal risk of deposition-contamination.