Used ULVAC VEP-1000 #9313810 for sale

ULVAC VEP-1000 is a vertical electron cyclotron resonance (ECR) reactor designed for high-throughput chemical vapor deposition (CVD) processes. The ECR reactor is used to create a plasma, which then becomes the source of radicals needed for CVD processes. VEP-1000 is best suited for use in applications such as graphene growth, as is the case with many ECR reactors. ULVAC VEP-1000 is equipped with a permanent magnet equipment developed with NbFeB permanent magnets and aluminum coil housings. This system magnetically confines the plasma within the reactor, resulting in an enhanced plasma density and improved uniformity. VEP-1000 also incorporates highly featured microwave generator and power supply systems, enabling silent, stable, and safe operations. ULVAC VEP-1000 includes a six-pocket precursor injector, allowing for the introduction of up to six different precursors to the plasma chamber. The injection angle of the precursors can be adjusted for controlling the plasma density and uniformity. VEP-1000 has a maximum deposition rate of 10.4 nm/s and a process temperature range of 5 to 850°C. ULVAC VEP-1000 has a single axis tiltable substrate holder and a built-in cooling unit for increased process stability. The built-in wafer cooling machine allows for the efficient transfer of heat generated during the process. The complete tool of VEP-1000 is based on an open architecture allowing for a high degree of configurability and compatibility with other controllers, instruments, and user application modules. ULVAC VEP-1000 is designed to be easily maintained and includes an automated maintenance asset for regularly cleaning and maintaining the internal parts of the model. Its robust design and automated features ensure reliable and repeatable process results as well as a long service life. VEP-1000's advanced automation feature also drastically reduce set-up and maintenance time, making it an ideal choice for many CVD applications.