Used UNAXIS / OERLIKON / ESEC LA #9308045 for sale

UNAXIS / OERLIKON / ESEC LA Reactor is a continuous industrial plasma processing system designed for various industrial applications. It is specifically intended for the production and etching of advanced devices and electronic components. ESEC LA Reactor is composed of a chamber with an internal magnetron source. The chamber is designed with a double-baffle geometry, granting improved control of flux lines which are maximized by the use of magnetic fields. The overall design presents a high-conductive wall which favors the rapid cooling of the process. The operations of this reactor are carried out under low pressures and high temperatures in a variety of gases, such as xenon, oxygen, chlorine, hydrogen and nitrogen. The main advantages of UNAXIS LA Reactor over other models consist in its parallel power distribution, stable plasma characteristics, high emission current of up to 800 A, service free operation, low operational cost, and fast start-up times. The control of the reactor provides great accuracy and repeatability of the process, giving the reactor high repeatability. This makes it highly suited for medium to large industrial production. OERLIKON LA Reactor is equipped with a number of safety features which provide a high safety level throughout the production of advanced devices and components. These safety measures include low electric voltage limits, built-in exhaust blowers for evacuation of process by-products, gas mixtures and mixtures with liquid or solid particles, as well as a monitored level for sparkless activities. Another key feature of LA Reactor is the incorporation of an advanced power generator that offers the desired changes in the pulsed power. Such changes depend on the required level of etching and provide higher resolution and cleaning of the area. This feature allows the reactor to be used in more precise operations and increase the productivity without compromising the quality. UNAXIS / OERLIKON / ESEC LA Reactor is thus an advanced, efficient and feature-rich industrial plasma processor for producing and etching of advanced devices and components. It offers excellent process control and safety measures, and a high level of precision and repeatable operations. It is thus particularly recommended for high volume industrial production applications.