Used VEECO CVC #9307852 for sale

VEECO CVC (Chemical Vapor Deposition) reactor technology is a high-precision deposition method enabling the deposition of nanoscale to micro-scale layers of materials to large substrates. This equipment can create nanoscale layers of a variety of elements including metals, oxides, and polymers, as needed. It is a universal system allowing for a single module to act as a deposition, stoichiometry, or etching unit for fab lines working with advanced semiconductors - from digital to MEMs and III-V devices. CVC reactor machine is composed of an enclosed chamber, a heated substrate, and a pair of operator-controlled valves connected to gas lines. At the start of the cycle, the chamber is sealed and a pre-selected pressure is maintained. A purge gas is used to maintain cleanliness and prevent gas contamination. When it is initiated, a carrier gas, such as Helium, argon, or nitrogen, is passed into the chamber. The appropriate reactant gases are added to the carrier gas in precise quantities and at predetermined temperatures, ensuring that a uniform film is deposited over the substrate. The reactor tool is automatically monitored and controlled throughout the process. The depositing process in VEECO CVC takes place from two to five hours, depending on the required film thickness and type. During deposition, materials like silicon dioxide, silicon nitride, and other alloys are added to the substrate and each layer is carefully and precisely controlled. The higher the quality of the deposited layer, the less defects, which allows for the creation of submicron devices. CVC reactor technology has a number of advantages, particularly in terms of its deposition accuracy and uniformity. It is also capable of producing high-quality layers with precise control. Its compact size allows it to be integrated into a range of production tooling footprints. Additionally, its precise gas control enables a variety of processes including nitriding, oxidation, etching, and deposition with minimal contaminations making it ideal for a range of applications. VEECO CVC process improves the quality of depositions because of its uniformed composition and fewer issues with proximity of tolerances making it suitable for a range of nano-applications. Finally, the cost-effective nature of its production makes its ideal for fab production lines. The use of CVC reactors can improve the deposition process and lead to more uniform layers with better electrical properties and can significantly reduce the time needed for deposition.