Used VEECO E450 #293641839 for sale

VEECO E450 is an atomic layer deposition (ALD) reactor that is used for deposition of thin films with great conformality and uniformity. It is a multi-purpose tool designed to satisfy the requirements of smaller scale semiconductor fabrication processes such as thin-film deposition, epitaxy growth, and etching. The reactor provides excellent process repeatability and precision, yielding higher yields and improved overall process control. E450 is equipped with a dual-source, low-energy electron-beam evaporation equipment and a variable metal oxide source. This evaporator allows for high-quality thin films to be deposited onto substrates with improved uniformity, thickness, and homogeneity. The metal oxide source is capable of producing films with extremely narrow thickness profiles, which is important for high-performance device fabrication. Additionally, the system can be configured to perform a variety of ALD processes and films with different chemical compositions. VEECO E450 features an advanced unit level control machine that provides precise temperature, time, and pressure control for improved process yield and control. The tool has the capability of controlling more than 25 process variables in order to achieve desired deposition results. It also features integrated metrology and analysis capabilities to measure film thickness and quality as well as to facilitate advanced process control. E450 reactor is designed for flexible production process with high uptime, repeatability, and reliability. It is built with modern, advanced components and technologies, including two low-temperature reaction chambers, a fast-cycling loadlock, and highly efficient, low-ionization pumping systems. Additionally, process development and testing can be done in its integrated test chamber. VEECO E450 reactor is a key piece of equipment for the fabrication of advanced semiconductor devices. It is an easy-to-use asset that provides excellent film uniformity, high yields, and repeatability. Additionally, through its advanced model level control and integrated metrology, it ensures that the desired thin film deposition results are consistently achieved.