Used VEECO / EMCORE D180 #293760075 for sale

VEECO / EMCORE D180 is a compact, vertical thermal plasma reactor, suitable for various applications in the fields of materials processing, etching and deposition. It is designed to operate with diameters of up to 35 centimeters and has a replaceable substrate holder that can be quickly exchanged between processes. The reactor is equipped with a 3.6 kW capacitively coupled DC power supply, triangular RF generator for plasma excitation, and an accurate temperature controller for reactor temperature control. The main components of the reactor are the vacuum chamber, the power supply, and the source assembly. The vacuum chamber is a stainless steel construction and is designed to form and maintain a low pressure (<10 mTorr) with the help of a vacuum pump. The power supply enables a uniform power distribution and is thus suitable for a high plasma density, thereby optimizing the process parameters. The source assembly helps to provide microwave energy for the plasma generation. VEECO D180 reactor is also equipped with a thermal zone containing a heating element, a cooling coil and a radiation shield. The heating element is employed for raising the temperature up to 1,500°C and the cooling coil is used for rapid cooling of the substrate. The radiation shield is made of graphite and acts as an insulator between the substrate and the chamber walls. Vacuum operation of the reactor is provided through the Sub-Queuer, a programmable vacuum control system. This system can be linked to other process parameters such as the power supply, cooling, process timing, and shut down procedures. The Sub-Queuer also allows for maintenance of a steady process atmosphere. Safety features built-in to EMCORE D-180 include an emergency pressure valve, flow switch, and pressure relief valve. The flow switch is used to detect anomalies in pressure and the pressure relief valve is used to manually adjust the operating pressure, preventing the system from reaching dangerous levels. In addition, D-180 has been designed for uniform and high-density plasma operation. This enables the accurate control of deposition and selective etching. Furthermore, the vertical chamber design ensures uniform coating, while the replaceable parts ensure easy maintenance and cleaning.