Used VEECO / EMCORE D300 #9250874 for sale

VEECO / EMCORE D300 is a RF Inductively Coupled Plasma (ICP) reactor. It is a tool used to create high-quality, high purity polysilicon thin films. It is made for vertical or horizontal operation on both 8" and 12" wafers and its small footprint makes it suitable for industrial scale production. VEECO D300 utilizes ICP to generate a highly ionized point-source plasma within the reactor chamber. The ICP creates the plasma by generating a high-frequency field which induces current within the plasma and creates a highly ionized point-source. The highly ionized point-source plasma is key, as it promotes high temperature, electron density, and uniformity within the reactor chamber. EMCORE D300 is equipped with three different susceptors. These are utilized to mount the wafer, regulate temperature, and to protect the silicon from being etched during plasma exposure. The closed loop control equipment of D300 provides precise gas flow rate control, allowing the user to precisely adjust the flow rates and create custom recipes for different polysilicon films. VEECO / EMCORE D300 is also equipped with a Gas Neutralizing System to help minimize the effects of the byproducts created during the polysilicon process. The reactor is designed to promote uniform temperature, electron density, and process chains and recipes. VEECO D300 is built with an advanced two-zone RF power delivery unit that allows for greater control over the RF field. These two zones can be adjusted independently to provide an ideal, balanced environment for optimal processing. EMCORE D300 also features a high-quality quartz deposition chamber which encloses and protects the wafer during the process. The deposition chamber is designed to ensure uniform deposition and to minimize any defects that may occur on the wafer. Overall, D300 provides a robust, efficient ICP reactor that promotes high-quality, high purity polysilicon films. Its closed loop control machine and two-zone RF power delivery tool provide reliable and durable performance for industrial applications. Its quartz deposition chamber ensures uniform deposition and helps minimize any defects that may occur on the wafer.