Used VEECO / EMCORE E300 #293744722 for sale

Manufacturer
VEECO / EMCORE
Model
E300
ID: 293744722
MOCVD System.
VEECO / EMCORE E300 is a compact, stand-alone electron beam evaporation reactor that is used for reactive evaporation, remote deposition, and sputtering processes. This reactor is designed for semiconductor and analytical industries. VEECO E300 is a high-performance reactor that has a high capacity for thin film production. It is built upon a unique, full-field magnetron sputtering design that ensures an even material deposition. The reactor also employs VEECO patented QPA Zone™ technology to provide precise control over process conditions such as temperature, helium pressure and power. This makes it easier for operators to monitor and analyze your deposition processes. EMCORE E300 features a large chamber that can accommodate various workpieces. Its design maximizes the utilization of surface area and creates better uniformity of thin film depositions. E300's generous workspace also allows users to quickly change gases and enable rapid transition between processes. In addition, VEECO / EMCORE E300 features a user-friendly equipment that allows operators to easily monitor, adjust, and customize the process. The system can also be integrated with other EMCORE systems such as VEECO / EMCORE IonBeam™ Unit, VEECO MassSpec™ Machine, and EMCORE Monitor Tool. This creates a comprehensive suite of tools for precision deposition and analysis. For its evaporation operations, VEECO E300 can be used for reactive thin film growth processes such as titania, lanthanum oxide and boron oxide deposition. The evaporation sources located inside the reactor can be cycled on and off to adapt to different types of thin film deposition processes. The reactor also features a one-button turnkey process that provides fast turnaround and optimal process parameters. EMCORE E300 also employs innovative safety features such as vacuum interlocks and low noise emission. E300 reactor is a powerful, user-friendly tool that enables precise sputtering and deposition processes for a wide range of applications. Its efficient material coverage and accurate control make it an ideal choice for semiconductor and analytical industries.
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