Used VEECO / EMCORE E300 #9265825 for sale

VEECO / EMCORE E300 reactor is a semiconductor process-enhanced deposition system designed to accommodate the latest advances in deposition technologies. It is a modular tool platform with fully integrated, modular hardware, supporting a wide range of processes including physical vapor deposition (PVD), electron-assisted PVD (e-PVD), plasma-enhanced atomic layer deposition (PEALD), and chemical vapor deposition (CVD). The modular hardware includes a mass-produced modular chamber, a large selection of internal ion beam sources, and a wide range of high-energy, high-current process sources. It also includes advanced gas and process-control systems for reliable, high-performance process control. VEECO E300 reactor supports thermal and e-beam driven deposition, as well as in situ monitor and control of end-of-line films. Its architecture allows for an equally fast process start-up time, as well as accurate in situ process control. This is crucial to the fabrication of high-end devices, where precise control of electronically-active films can have a major impact on device performance. Also, EMCORE E300 reactor has advanced plasma control capability, including the ability to deliver low-energy oxygen or nitrogen plasma to the substrate. The system can also perform step/flash lithography and lift-off, and supports substrates and wafers up to 200 mm in size. Additionally, E300 reactor is fitted with a full array of optical viewing capabilities, including a high-resolution, high-definition environmental microscope. This provides the user with real-time imaging of thin-film formation, enabling improved film characterization and/or process monitoring. VEECO / EMCORE E300 provides excellent thermal uniformity and compatibility with virtually all process gasses, making it ideal for producing high quality, high-aspect-ratio films. All of these factors combine to make VEECO E300 one of the premier solutions for advanced thin-film process integration.