Used VEECO / EMCORE E300 #9265827 for sale

Manufacturer
VEECO / EMCORE
Model
E300
ID: 9265827
Vintage: 2007
System Process: GaN 2007 vintage.
VEECO / EMCORE E300 is a high performing epitaxial reactor that is used in the production of various semiconductor materials and devices. VEECO E300 is a highly efficient deposition equipment that can be used for a wide range of processes. It features an advanced design that has been optimized for achieving high throughput and low cost of ownership. EMCORE E300 is a single wafer, high temperature, and low pressure chemical vapor deposition reactor. Its central chamber is a cylindrical vacuum chamber with a high temperature heating element mounted at the bottom. E300 can reach temperatures up to 1000°C and pressures up to 10 Torr in this chamber. It is designed for the deposition of a wide range of components including silicon, germanium, gallium, arsenic, indium phosphide, cadmium telluride, zinc selenide, and many others. The central chamber is equipped with several source ports, allowing laminar flow of gases in the chamber and enhancing the uniformity and quality of the Layer deposited on the wafer surface. VEECO / EMCORE E300 also includes a high performance multi-channel gas delivery system that allows multiple gases to be pumped into the chamber simultaneously with excellent process control. VEECO E300 is also able to accommodate multiple wafers with its adjustable wafer-to-source distance up to 4 inches. EMCORE E300 is also equipped with an intuitive console with a comprehensive control unit that offers outstanding control precision. This enables users to accurately adjust the processing reaction temperature and mixture of gases in order to produce superior device performances. Additionally, E300 also features an automatic flow control machine which uses a fast-response PID controller that constantly monitors each parameter and adjust the flow rate of the gases when needed. Overall, VEECO / EMCORE E300 is a superior epitaxial reactor that provides excellent performance and reliability. It is designed to meet the needs of the most advanced semiconductor production applications, providing a successful deposition process with a low cost of ownership.
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