Used VEECO / EMCORE E400 #293641830 for sale

Manufacturer
VEECO / EMCORE
Model
E400
ID: 293641830
MOCVD System.
VEECO / EMCORE E400 is a compact low energy plasma reactor designed for a wide range of thin film deposition applications. VEECO E400 is the ideal deposition platform for thin-film deposition needs found in optoelectronics and nanotechnology research and manufacturing. The unique geometry of EMCORE E400 includes a cylindrical target chamber with a single, low-pressure, low-energy point plasma source embedded within. The reactor is specifically designed for rapid, low temperature processing of a variety of materials, from simple oxides to complex organic molecules. E400 can handle pressures of up to a few mT and process gases up to 7 standard cubic centimeters per minute (sccm). VEECO / EMCORE E400 features a number of advanced technologies, such as Active Source/Substrate Matching (AS/SM) and Data Logging/Monitoring (D/M), which allow for precise control and analysis of the deposition process. AS/SM ensures that the substrate is heated evenly, while D/M provides an instantaneous diagnosis of the process parameters, enabling quality control and process development. VEECO E400 can also be integrated to a customized Automated Deposition System (ADS), allowing for automated, high-throughput deposition of thin films on a variety of substrates. EMCORE E400 reactor is extremely flexible and well suited for small batch production as well as for large-scale production runs. Its ability to be capable of adjustment with just a few clicks of a mouse, allows for easy and rapid processing of any deposition substrate. E400 can be configured with a variety of components to meet the exact deposition requirements of any specific application, such as higher-temperature substrates, low-pressure gases and volatile compounds. In short, VEECO / EMCORE E400 is an advanced, flexible and compact plasma reactor designed for a variety of thin-film deposition needs found in optoelectronics and nanotechnology research and manufacturing. Its low pressure and low energy point plasma source embedded in a cylindrical target chamber provide precise process control, while its ability to be configured with a wide range of components enable custom deposition requirements. VEECO E400 is the perfect choice for both small-batch and high-volume production runs.
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