Used VEECO / EMCORE E400 #9047867 for sale

VEECO / EMCORE E400 is an epitaxial metal-organic chemical vapor deposition (MOCVD) reactor designed to process compound semiconductor materials such as gallium arsenide, indium phosphide, and aluminum gallium arsenide. VEECO E400 is a multi-zone, horizontal-tube, flow-through equipment which offers greater accuracy and reliability than single-zone systems in a much smaller physical footprint. The reactor's inner hot zones are fronted by two pre-heat zones. The hot zones can be individually heated, using an integrated remote control system, to temperatures ranging from 100 to 1000°C. The hot zones are separated by an upper and lower cooling cavity, designed for cooling of hot zones during process runs. EMCORE E400 also features multipoint control which allows for precise temperature control across the full range of user-set and monitored conditions. The reactor also provides for efficient and highly repeatable process control, with excellent reliability and repeatability of deposited films. E400 employs a unique dual-inlet design, which allows independent control of the carrier and reactant gases, as well as independent control of both the gas pressure and flow rate. This ensures uniform gas distribution throughout the reactor resulting in increased film quality and uniformity. VEECO / EMCORE E400 also features an integrated high frequency plasma generator, allowing for increased deposition rate, film uniformity, and improved film properties. This unit also helps to reduce the fouling of the reactor, maintaining consistent power on coils and substrates. The reactor also incorporates an additional plasma pre-ionization feature, which reduces the deposition rate and removes impurities from the process. The tool also features an optional slit-nozzle injector assembly for increased process uniformity. This innovative incorporation of a fixed-nozzle injector assembly helps reduce nitrogen consumption, maintain steady-state process stability, and maximize process repeatability. Overall, VEECO E400 reactor provides users with improved and repeatable device attributes, process uniformity, and fine-tuned control capabilities. The machine maintains consistent gas pressures throughout the process ensuring uniform and repeatable deposition quality. The addition of the plasma generator, optional injectors, and independently controlled hot zones provides users with greater accuracy and control over the MOCVD process, ensuring optimal device performance with each and every run.