Used VEECO / EMCORE E400 #9302576 for sale

VEECO / EMCORE E400 Reactor is a general-purpose reactor tool designed for use in various thin-film growth applications. This reactor is a vertically-oriented system that achieves an exceptional level of performance with the ability to support a number of applications including forming, etching, material deposition, and annealing. Its unique design features an upper portion which consists of three thermal zones - a high-temperature zone (typically 250 -600 °C), a medium-temperature zone (typically 100-400 °C) and a low-temperature zone (typically 50-300 °C). These zones are independent of each other, providing precise temperature control and allowing for low-temperature processes to occur at the same time as the higher temperature processes are underway. The reactor has a unique symmetric flange-type loadlock design that allows for different substrate sizes and relative motion between the sources and substrates. This adds flexibility to the tool, allowing for the deposition of films on non-square substrates, such as satellites or other cylindrical-shaped substrates. The dual-bay design of VEECO E400 allows for a greater level of process flexibility as more processes can be conducted concurrently without sacrificing performance or productivity. EMCORE E400 also features a wide range of process chamber capabilities, including low-pressure/high-pressure high-power, low-pressure/high-pressure flashlamp, DC (Direct Current) and RF (Radio Frequency) sputter deposition, ionized physical vapor deposition (iPVD), metal organic chemical vapor deposition (MOCVD), and plasma assisted chemical vapor deposition (PACVD) capabilities. Its new Hot Re-packaging capability allows for faster material deposition in a variety of processes. Additionally, the reactor has a fast gas pressure change rate of greater than 1000 Torr/sec providing high-quality process results. E400 Reactor is a high-end, highly capable tool that is ideal for developing next-generation products requiring large area substrates, high precision film deposition, increased material throughput or high power capabilities. Its advanced thermal management and uniformity, multi-zone flexibility, high throughput, low-temperature compatibility, and high-power capabilities make it an attractive solution for many applications where performance or efficiency are a priority.