Used VEECO / EMCORE K465 #293768283 for sale
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ID: 293768283
Vintage: 2007
MOCVD System
(2) Heat exchangers
(2) Dry pumps
(4) Boxes
(2) Exhaust exchangers
Filter
Frame
Growth chamber
L Chamber
2007 vintage.
VEECO / EMCORE K465 reactor is a versatile solid source molecular beam epitaxy (MBE) platform for semiconductor thin-film deposition and material characterization. The equipment is designed for research and development of advanced compound semiconductor devices such as photonic integrated circuits and laser diodes, for example. VEECO K465 is configurable as a standard system with a single source, or as an advanced platform with two or more effusion cells, as well as support components such as mass flow controllers, a gas delivery unit, and a vent/purge module. The standard version has a small chamber size of 14-inch by 14-inch and a maximum pressure of 1E-7 Torr. The chamber components are built from stainless steel and UHV-grade CF flanges to ensure excellent performance in ultrahigh vacuum applications. The bottom of the chamber is baffled to contain the molecular flux and reduce gas convection to the sample. The heating element is based on an embedding element made of ceramic-lined stainless steel and has a temperature range from 25°C to 1000°C. The chamber is designed for maximum utilization of the available space for sample loading and is equipped with an automated four- position sample loader and carousel machine. EMCORE K465 platform is also designed to handle different reactive gases and can be fitted with VEECO proprietary gas delivery tool for safe and precise gas control and flow. With the dual source option, the user can select multiple source materials and configure them independently for co-deposition and split modes. The process control systems are designed for automated optimization and monitoring. A unique mass flow and partial pressure control (MPPC) asset provides precise control: this ensures the stability of the process rates and eliminates the need for frequent calibration. The model is also equipped with optical and X-ray diagnostics capabilities to measure the optical properties and semiconductor epitaxial layers growth in the chamber. The optical laser equipment features an improved spatial resolution and spectral analysis for the measurement of ALD (atomic-layer-deposition) films thicknesses and refractive indices. Other advanced techniques such as Raman and VUV emission spectroscopy are available for essential research of molecular layer deposition.System safety is ensured by a nitrogen backfill unit to avoid air and oxygen contamination. K465 reactor is built to accommodate a range of different substrates, including wafers, ceramic plates, and pleat containers. The MBE tool is reliable, efficient, and offers superior performance for a wide range of compound semiconductor materials applications.
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