Used VEECO / EMCORE K465i #293587351 for sale

VEECO / EMCORE K465i is a high temperature single-wafer chemical vapor deposition (CVD) reactor utilized within the semiconductor fabrication process. It is capable of depositing healthy, uniform thickness films of silicon oxynitride (SiON) and silicon nitride (SiN) with excellent step coverage up to 100nm film thickness. The repeatable deposition performance of VEECO K465i ensures superior high thermal conductivity, optical, or mechanical properties for any application. The reactor can use reactive gases such as NH3 and SiH4 for deposition among others. It is designed for high throughput, ensuring uniform film composition over an entire wafer with fast, repeatable temperature ramp rates. Total throughput typically range between 50W-150W with sustained temperatures of up to 1000°C. EMCORE K465i imposes precise and precise temperature ramps for deposition control. It is done by controlling the precise sequencing of the heater elements, chamber pressure and flow rate of reactive gases. It uses two separate sources of process gas. One is a dry nitrogen dry-gas source, used to cool the process by a cryogenic pump to cool the gas rapidly and maintain a stable chamber temperature. The second provides a supply of reactive gases, including H2, N2, and NH3 and a catalyst gas, such as SiH4. By controlling the ratio of the two gases, a precise material deposition rate and uniformity can be obtained. K465i includes several key standard features, such as a ceramic substrate paddle, pyrometer to measure instantaneous substrate temperature, mechanical chuck vibration, and environmental sensor for end point recognition. All components are designed for easy integration into fabrication facilities. VEECO / EMCORE K465i provides precision and uniformity in deposition processes. It offers high throughput with precise and accurate temperature ramp rates and excellent step coverage. With features such as easy integration, ceramic substrate paddle, pyrometer, mechanical chuck vibration, and environmental sensors, VEECO K465i provides efficient and reliable deposition of silicon nitride and silicon oxynitride films in semiconductor fabrication processes.