Used VEECO / EMCORE K465i #9012796 for sale
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ID: 9012796
Vintage: 2010
MOCVD system
GaN
Max temp 1250C degree set point
8 PSU
DRT (bow, real temp) (2) Real temp
8 x MO lines
NH3, SiH4
(2) MO concentration control
(2) Ebara process pump
Automated loading chamber
Nexus control system
H2 + NH3 gas monitor
N2+NH3 POU purifiers
(2) Johson Matthey V-480 H2 Pd cell purifiers
(2) hygrometers
(6) water cooled MO baths
Fully automated metal-organic chemical vapor deposition (MOCVD) system designed for the production of high-brightness light-emitting diodes
Can accommodate up to (45) 2" substrates (or 1x8") in one process
Uses FlowFlange technology designed to create a uniform alkyl and hydride flow across all wafers
Temperature uniformity by (3) separate heating zones controlled by RealTemp200 systems and additional pyrometer
Wafer curvature is monitored by dedicated deflectometer
Fully robotized carrier handling tool allows for continuous operation
All manuals and schematics for reactor from original Veeco purchase
(3) brand-new wafer carriers/susceptors
K465i growth chamber and Uniform Flow Flange assembly
Rotary Robot Arm Transfer assembly (robot, end effector, robot chamber, buffer chamber, gate valves, controller, etc.)
Laminar flowhood wafer loading platform
Complete gas panel (NH3/N2/H2, MO source lines, SiH4 source line), injector block
Ferrofludic turbodisc rotation assembly
Turbodisc controller
(2 sets) Veeco K465 heater assembly and filaments (1 installed in chamber, 1 full set as a spare)
(2) Ebara ESA-25D process pumps
Load lock pump
(2) high-capacity particle filter assemblies.
(2) particle filter elements
Reactor pressure throttle valve
(8) DC power supplies for filaments
Eurotherm controllers
Reactor control CPU, Servo CPU, (2) PC monitors, keyboard and mouse
(2) RealTemp 200 Modeling System with dedicated CPU
(1) DRT-210 Real-Time Monitoring System with spare CPU
(4) Lauda Model 215 bubbler baths
(2) Lauda Model 235 bubbler baths
(2) Lytron Heat Exchangers for reactor
Growth chamber baratron gauge
(2) – Piezocons
Flow Flange Lift Cart
H2 Pd purifier cabinet model: HP 200/400 V-Purge
NH3 Purifier - Aeronex 10M
N2 Purifier - Aeronex 10M
Hygrometer Assy 2-channel Panametrics
CM4 Gas monitor
Spare Baratron (pressure manometer) and MFC
(3) spare Eurotherm controllers
(2 cases, 1 partial) MassVac filter elements
2010 vintage.
VEECO / EMCORE K465i medium current electron beam (EB) wafer technology reactor is a state-of-the-art equipment used in semiconductor and display industries for fabrication of thin films. It uses a mix of photolithography, electronic beam (EB) lithography technology, and evaporation techniques. This reactor is equipped with an electron source, a beam energy supply, an evaporation source, and a maskless lithographic stage. VEECO K465i is designed to handle high current processes of up to 600 mA. This high-end technology enables engineers to achieve uniformity in patterning and thin-film growth on multiple substrates in one production step. It is also capable of processing multiple materials, such as electron-deposition materials, metal, and polycrystalline films. EMCORE K465i comes equipped with a direct current (DC) filtering technology that protects against arcing, resulting in improved process consistency. The electron source in K465i is a gun-based electron emitter, which is powered by a programmable constant voltage power supply. This ensures consistent power with no output ripple. VEECO / EMCORE K465i EB wafer technology reactor also offers a vacuum-tight construction, including doors to prevent contamination of the interior components. Additionally, the reactor features an automated loading and unloading system, complete with a tray pre-loaded with wafers for efficient operation. VEECO K465i EB wafer technology reactor also has a built-in temperature control unit that ensures uniform process temperature. This prevents any degradation in the processing results, as well as thermal runaway from occurring. It also offers a reliable controller machine and an intuitive user interface that allows for rapid and easy adjustment of parameters. In conclusion, EMCORE K465i medium current electron beam (EB) wafer technology reactor is an advanced and reliable tool for fabricating thin films. It offers a sophisticated filtration technology, a highly reliable electron source, and a temperature control asset, making it the ideal medium current wafer technology reactor for producing thin-film circuitry and other materials.
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