Used VEECO / EMCORE K465i #9043779 for sale

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Manufacturer
VEECO / EMCORE
Model
K465i
ID: 9043779
MOCVD-GaN system, 6" K-MOCVD K465i GaN MOCVD reactor VEECO TURBODISC - K465i GaN MOCVD Reactor Cart Assembly - K465i GaN: 1099755-1001 K465i GaN growth chamber K465i Uniform Flow Flange assembly Water-cooled Turbodisc susceptorless spindle rotation system including integrated errofluidic rotation mechanism Reactor temperature management system including water to water heat exchanger with temperature flow and water level alarms Water cooled baseplate assembly MFC purged eight position viewport for in-situ measurements Mechanical switch gauge for over pressure monitoring Veeco K465 Heater Assembly Proprietary heater filament Three zone resistive heater assembly High temperature heat shields, insulators, and electrical feedthroughs Wafer Handling Assembly - K465i GaN: 1095778-4202 Laminar Flowhood Integrated laminar flowhood wafer loading platform for easy wafer loading Growth Chamber Exhaust System (Exhaust to Top) 1.5" exhaust line Ebara ESA-25D process pumps Manual and pneumatic ball valves High capacity particle filter assembly Leak detector port Electronic pressure transducer Reactor pressure control throttling valve Overpressure protection via switch gauge User Interface - Swing Arm: 1094894-3001 (2) Monitors Keyboard/Mouse Ergonomic Swing Arm Attached to Tool Rotary Transfer Assembly - K465i GaN: 1094841-2001 High vacuum aluminum transfer chamber with viewports Single modular dwell station with 2-carrier capacity Pneumatically controlled, interlocked rectangular L-VAT door for isolation between growth chamber and transfer chamber Vacuum robot with end effector for wafer carrier transfer Pressure measurement of loadlock chamber Mechanical switch gauge for overpressure monitoring Electronics Control Module - K465i GaN: 1091932-4213 (8) DC power supplies for heater power Digital devices on industry-standard DeviceNet digital network Software integrated with Omron PLC Standardized cables and interconnects Capable of facilities UPS (customer supplied) H2 Detector included Circuit Breaker Panel 380 VAC - K465i GaN: 1091831-4004 Source Delivery and Reactor Housing Module - K465i Custom Configuration - 1093574-**** Modular Reconfigurable Gas Panel Includes: Supply Gas Regulator Slices Hydride Dopants Vaccum/Vent Leak Check Assembly Supply Gas Assembly Hydride / Shroud Assembly Flow Panel with Injector Block Phantom Line option Bubbler Slices Temperature Regulating Liquid Baths Bubblers Manifold Type: Dual Switching (Nitrogen & Hydrogen) Process module custom characteristics listing Reactor Interface Flowpanel - K465i Direct Inject Hydride System Metal sealed source mass flow controllers Alkyl injector block phantom MFC option Supply Gas Sub-Assembly GaN Standard: 2xN2, 1xH2 regulator, 2 N2/H2 Manual valve slice with switch gauge & regulator Label NH3 Supply Gas Subassembly - Slice #2 Manual valve slice with switch gauge & regulator Supply Gas Subassembly - Slice #4 Manual valve slice with switch gauge & regulator Option for SiH4 or Si2H6 or H2Se or H2S Supply Gas Subassembly - Slice #5 Empty Gas Source - Slice #3 Dilution with isolation valve, dual push gas Option for SiH4 or Si2H6 Bubbler Slice Position #1 Empty Bubbler Slice Position #2 Configuration Bubbler #2: TMAl Slice#2: Dilution, dual gas feed, single bubbler Multi-Valve High-Purity Welded Manifold. Metal Sealed Mass Flow controller(s). Metal Sealed Integrated Pressure Controller(s). Integrated Spool piece for Binary Gas Monitor. Bubbler Slice Position #3 Configuration Bubbler #3: TEGa Slice#3: Standard, dual gas feed, single bubbler Multi-Valve High-Purity Welded Manifold. Metal Sealed Mass Flow controller(s). Metal Sealed Integrated Pressure Controller(s). Integrated Spool piece for Binary Gas Monitor. Bubbler Slice Position #4 Configuration Bubbler #4: TMGa Slice#4: Standard, dual gas feed, single bubbler Multi-Valve High-Purity Welded Manifold. Metal Sealed Mass Flow controller(s). Metal Sealed Integrated Pressure Controller(s). Integrated Spool piece for Binary Gas Monitor. Bubbler Slice Position #5 Configuration Bubbler #5: TMGa Slice#5: Standard, dual gas feed, single bubbler Multi-Valve High-Purity Welded Manifold. Metal Sealed Mass Flow controller(s). Metal Sealed Integrated Pressure Controller(s). Integrated Spool piece for Binary Gas Monitor. Bubbler Slice Position #6 Configuration Bubbler #6: Customer Specified Slice#6: Standard, dual gas feed, single bubbler Multi-Valve High-Purity Welded Manifold. Metal Sealed Mass Flow controller(s). Metal Sealed Integrated Pressure Controller(s). Integrated Spool piece for Binary Gas Monitor. Bubbler Slice Position #7 Configuration Bubbler #7: Cp2Mg Slice#7: Standard, dual gas feed, single bubbler Multi-Valve High-Purity Welded Manifold. Metal Sealed Mass Flow controller(s). Metal Sealed Integrated Pressure Controller(s). Integrated Spool piece for Binary Gas Monitor. Bubbler Slice Position #8 Configuration Bubbler #8: TMIn Slice#8: Standard, dual gas feed, single bubbler Multi-Valve High-Purity Welded Manifold. Metal Sealed Mass Flow controller(s). Metal Sealed Integrated Pressure Controller(s). Binary Gas Monitor. Bubbler Slice Position #9 Configuration Bubbler #9: TMIn Slice#9: Standard, dual gas feed, single bubbler Multi-Valve High-Purity Welded Manifold. Metal Sealed Mass Flow controller(s). Metal Sealed Integrated Pressure Controller(s). Binary Gas Monitor. Liquid Refrigerator Baths - Quantity = 4 Water cooled version Model Lauda 215 Operating temperature range: -30 degrees C to 200 degrees C. Adjustable over-temperature protection. Bath cavity dimensions: 8.5" x 8.5" x 9.8" Liquid Refrigerator Baths - Quantity = 2 Water cooled version Model Lauda 235 Operating temperature range: -30 degrees C to 200 degrees C. Adjustable over-temperature protection. Bath cavity dimensions: 13.8" x 11.8" x 9.8" In-Situ Monitoring System 1096010-1036 (1) RealTemp 200 Monitoring System - Quantity Combined pyrometer and reflectometer unit to enable Emissivity Corrected temperature measurement and control. Accurate reflectance and temperature measurement of individual wafers. (2) DRT-210 Real-time In-situ Monitoring Systems Integrated Deflectometer, Reflectometer, and Thermometer to monitor: Curvature of Epi-wafer Layer Thickness and Refractive Index Wafer Pocket Temperature with Wafer Reflection Compensation Integrated Electronics Assembly Dedicated computer and In-Situ Interface Controller Advanced software package for data analysis. High Speed Data Acquisition for Wafer Differentiation Auto Start/Stop integrated with Veeco’s RecipeX Software. Wafer Carrier for K465i GaN (2) Veeco P/N 1200232 5 X 6" Consumables Kit 1093608-1004 Install-Phase consumable parts Gaskets, o-rings, screws, nuts, washers 1/8" SS Bubbler Legs - Quantity = 8 sets Server PC for Nexus Datalogging (Rackmount) - 1094416 NEXUS Control & Monitoring Software - 1094417 Nexus includes: Spreadsheet Recipe generation Capable of nested recipes Reduced complexity Easy editing - Excel style Easy porting from system to system Automatic Calculations simplifying Injector block parameters Bubbler parameters - minimize source material use Operator Interface One button execution Variety of selectable monitoring functions Customer user-defined privileges Maintenance Automatic Paretos redictive maintenance Remote Access Via LAN Data Management Access to data files by date or run Data manipulation / viewing of all parameters Industrial-Grade Server Advantech AIMB-766G2 Core 2 Quad, Q9400, 2.66GHz RAM, 240pin DIMM, DDR2, 2GB HDD, 250GB, SATA II Enterprise CD/DVD RW DRIVE Windows Server 2003, Web Edition Systems utilize shared scrubber. The scrubber is not included CE Mark 2010 vintage.
VEECO / EMCORE K465i is a Plasma-Enhanced Chemical Vapor Deposition (PECVD) reactor engineered for industrial and research applications requiring precision etch and deposition processes. The chamber is configured as a dual-RF coaxial design, utilizing two independent RF sources for etching and deposition. An integrated substrate heat-sink provides uniform, temperature-controlled deposition. VEECO K465i is equipped with EtchPlus technology that offers precise and repeatable etching processes with uniform downwards plasma density profiles. It also offers a wide range of film properties, including high-quality optical properties and excellent film uniformity and step coverage. The chamber of EMCORE K465i is designed for compatibility with various wafer sizes and materials, and includes quartz shield plates to reduce direct EMI interference. It is capable of performing single-wafer processes and wafer-level repetition processes. The reactor can also be customized for specific process requirements with configurable hardware and software options. K465i has multiple gas injection ports and a fully-automated gas control equipment for precise and intimate mixing of gases. This ensures optimal interactions between the gases and plasma, reducing particle contaminants and unloading inefficient reaction byproducts. The reactor is designed for easy maintenance, featuring an external gas inlet system which prevents the source from being disconnected from the unit during maintenance. The reactor is equipped with an advanced diagnostics suite, including spectroscopy, imaging, and particle analysis systems for feedback on process progress and product quality. An exhaust machine with height-adjustable exhaust ports allow for effective removal of process byproducts from the chamber, reducing cleanroom contamination levels. Additionally, VEECO / EMCORE K465i is designed for improved safety and ergonomics with comprehensive diagnostic and safety features as well as an intuitive operator interface. Overall, VEECO K465i is an advanced PECVD reactor that offers a reliable and cost-effective solution for a wide variety of industrial and research applications.
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