Used VEECO / EMCORE K465i #9043779 for sale
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ID: 9043779
MOCVD-GaN system, 6"
K-MOCVD
K465i GaN MOCVD reactor
VEECO TURBODISC - K465i GaN MOCVD
Reactor Cart Assembly - K465i GaN: 1099755-1001
K465i GaN growth chamber
K465i Uniform Flow Flange assembly
Water-cooled Turbodisc susceptorless spindle rotation system including integrated errofluidic rotation mechanism
Reactor temperature management system including water to water heat exchanger with temperature flow and water level alarms
Water cooled baseplate assembly
MFC purged eight position viewport for in-situ measurements
Mechanical switch gauge for over pressure monitoring
Veeco K465 Heater Assembly
Proprietary heater filament
Three zone resistive heater assembly
High temperature heat shields, insulators, and electrical feedthroughs
Wafer Handling Assembly - K465i GaN: 1095778-4202
Laminar Flowhood
Integrated laminar flowhood wafer loading platform for easy wafer loading
Growth Chamber Exhaust System (Exhaust to Top)
1.5" exhaust line
Ebara ESA-25D process pumps
Manual and pneumatic ball valves
High capacity particle filter assembly
Leak detector port
Electronic pressure transducer
Reactor pressure control throttling valve
Overpressure protection via switch gauge
User Interface - Swing Arm: 1094894-3001
(2) Monitors
Keyboard/Mouse
Ergonomic Swing Arm Attached to Tool
Rotary Transfer Assembly - K465i GaN: 1094841-2001
High vacuum aluminum transfer chamber with viewports
Single modular dwell station with 2-carrier capacity
Pneumatically controlled, interlocked rectangular L-VAT door for isolation between growth chamber and transfer chamber
Vacuum robot with end effector for wafer carrier transfer
Pressure measurement of loadlock chamber
Mechanical switch gauge for overpressure monitoring
Electronics Control Module - K465i GaN: 1091932-4213
(8) DC power supplies for heater power
Digital devices on industry-standard DeviceNet digital network
Software integrated with Omron PLC
Standardized cables and interconnects
Capable of facilities UPS (customer supplied)
H2 Detector included
Circuit Breaker Panel 380 VAC - K465i GaN: 1091831-4004
Source Delivery and Reactor Housing Module - K465i
Custom Configuration - 1093574-****
Modular Reconfigurable Gas Panel Includes:
Supply Gas Regulator Slices
Hydride Dopants
Vaccum/Vent Leak Check Assembly
Supply Gas Assembly
Hydride / Shroud Assembly
Flow Panel with Injector Block
Phantom Line option
Bubbler Slices
Temperature Regulating Liquid Baths
Bubblers Manifold Type: Dual Switching (Nitrogen & Hydrogen)
Process module custom characteristics listing
Reactor Interface Flowpanel - K465i
Direct Inject Hydride System
Metal sealed source mass flow controllers
Alkyl injector block phantom MFC option
Supply Gas Sub-Assembly
GaN Standard: 2xN2, 1xH2 regulator, 2 N2/H2
Manual valve slice with switch gauge & regulator
Label NH3
Supply Gas Subassembly - Slice #2
Manual valve slice with switch gauge & regulator
Supply Gas Subassembly - Slice #4
Manual valve slice with switch gauge & regulator
Option for SiH4 or Si2H6 or H2Se or H2S
Supply Gas Subassembly - Slice #5
Empty
Gas Source - Slice #3
Dilution with isolation valve, dual push gas
Option for SiH4 or Si2H6
Bubbler Slice Position #1 Empty
Bubbler Slice Position #2 Configuration
Bubbler #2: TMAl
Slice#2: Dilution, dual gas feed, single bubbler
Multi-Valve High-Purity Welded Manifold.
Metal Sealed Mass Flow controller(s).
Metal Sealed Integrated Pressure Controller(s).
Integrated Spool piece for Binary Gas Monitor.
Bubbler Slice Position #3 Configuration
Bubbler #3: TEGa
Slice#3: Standard, dual gas feed, single bubbler
Multi-Valve High-Purity Welded Manifold.
Metal Sealed Mass Flow controller(s).
Metal Sealed Integrated Pressure Controller(s).
Integrated Spool piece for Binary Gas Monitor.
Bubbler Slice Position #4 Configuration
Bubbler #4: TMGa
Slice#4: Standard, dual gas feed, single bubbler
Multi-Valve High-Purity Welded Manifold.
Metal Sealed Mass Flow controller(s).
Metal Sealed Integrated Pressure Controller(s).
Integrated Spool piece for Binary Gas Monitor.
Bubbler Slice Position #5 Configuration
Bubbler #5: TMGa
Slice#5: Standard, dual gas feed, single bubbler
Multi-Valve High-Purity Welded Manifold.
Metal Sealed Mass Flow controller(s).
Metal Sealed Integrated Pressure Controller(s).
Integrated Spool piece for Binary Gas Monitor.
Bubbler Slice Position #6 Configuration
Bubbler #6: Customer Specified
Slice#6: Standard, dual gas feed, single bubbler
Multi-Valve High-Purity Welded Manifold.
Metal Sealed Mass Flow controller(s).
Metal Sealed Integrated Pressure Controller(s).
Integrated Spool piece for Binary Gas Monitor.
Bubbler Slice Position #7 Configuration
Bubbler #7: Cp2Mg
Slice#7: Standard, dual gas feed, single bubbler
Multi-Valve High-Purity Welded Manifold.
Metal Sealed Mass Flow controller(s).
Metal Sealed Integrated Pressure Controller(s).
Integrated Spool piece for Binary Gas Monitor.
Bubbler Slice Position #8 Configuration
Bubbler #8: TMIn
Slice#8: Standard, dual gas feed, single bubbler
Multi-Valve High-Purity Welded Manifold.
Metal Sealed Mass Flow controller(s).
Metal Sealed Integrated Pressure Controller(s).
Binary Gas Monitor.
Bubbler Slice Position #9 Configuration
Bubbler #9: TMIn
Slice#9: Standard, dual gas feed, single bubbler
Multi-Valve High-Purity Welded Manifold.
Metal Sealed Mass Flow controller(s).
Metal Sealed Integrated Pressure Controller(s).
Binary Gas Monitor.
Liquid Refrigerator Baths - Quantity = 4
Water cooled version Model Lauda 215
Operating temperature range: -30 degrees C to 200 degrees C.
Adjustable over-temperature protection.
Bath cavity dimensions: 8.5" x 8.5" x 9.8"
Liquid Refrigerator Baths - Quantity = 2
Water cooled version Model Lauda 235
Operating temperature range: -30 degrees C to 200 degrees C.
Adjustable over-temperature protection.
Bath cavity dimensions: 13.8" x 11.8" x 9.8"
In-Situ Monitoring System 1096010-1036
(1) RealTemp 200 Monitoring System - Quantity
Combined pyrometer and reflectometer unit to enable Emissivity Corrected temperature measurement and control.
Accurate reflectance and temperature measurement of individual wafers.
(2) DRT-210 Real-time In-situ Monitoring Systems
Integrated Deflectometer, Reflectometer, and Thermometer to monitor:
Curvature of Epi-wafer
Layer Thickness and Refractive Index
Wafer Pocket Temperature with Wafer Reflection Compensation
Integrated Electronics Assembly
Dedicated computer and In-Situ Interface Controller
Advanced software package for data analysis.
High Speed Data Acquisition for Wafer Differentiation
Auto Start/Stop integrated with Veeco’s RecipeX Software.
Wafer Carrier for K465i GaN
(2) Veeco P/N 1200232
5 X 6"
Consumables Kit 1093608-1004
Install-Phase consumable parts
Gaskets, o-rings, screws, nuts, washers
1/8" SS Bubbler Legs - Quantity = 8 sets
Server PC for Nexus Datalogging (Rackmount) - 1094416
NEXUS Control & Monitoring Software - 1094417
Nexus includes:
Spreadsheet Recipe generation
Capable of nested recipes
Reduced complexity
Easy editing - Excel style
Easy porting from system to system
Automatic Calculations simplifying
Injector block parameters
Bubbler parameters - minimize source material use
Operator Interface
One button execution
Variety of selectable monitoring functions
Customer user-defined privileges
Maintenance
Automatic Paretos
redictive maintenance
Remote Access
Via LAN
Data Management
Access to data files by date or run
Data manipulation / viewing of all parameters
Industrial-Grade Server
Advantech AIMB-766G2
Core 2 Quad, Q9400, 2.66GHz
RAM, 240pin DIMM, DDR2, 2GB
HDD, 250GB, SATA II Enterprise
CD/DVD RW DRIVE
Windows Server 2003, Web Edition
Systems utilize shared scrubber. The scrubber is not included
CE Mark
2010 vintage.
VEECO / EMCORE K465i is a Plasma-Enhanced Chemical Vapor Deposition (PECVD) reactor engineered for industrial and research applications requiring precision etch and deposition processes. The chamber is configured as a dual-RF coaxial design, utilizing two independent RF sources for etching and deposition. An integrated substrate heat-sink provides uniform, temperature-controlled deposition. VEECO K465i is equipped with EtchPlus technology that offers precise and repeatable etching processes with uniform downwards plasma density profiles. It also offers a wide range of film properties, including high-quality optical properties and excellent film uniformity and step coverage. The chamber of EMCORE K465i is designed for compatibility with various wafer sizes and materials, and includes quartz shield plates to reduce direct EMI interference. It is capable of performing single-wafer processes and wafer-level repetition processes. The reactor can also be customized for specific process requirements with configurable hardware and software options. K465i has multiple gas injection ports and a fully-automated gas control equipment for precise and intimate mixing of gases. This ensures optimal interactions between the gases and plasma, reducing particle contaminants and unloading inefficient reaction byproducts. The reactor is designed for easy maintenance, featuring an external gas inlet system which prevents the source from being disconnected from the unit during maintenance. The reactor is equipped with an advanced diagnostics suite, including spectroscopy, imaging, and particle analysis systems for feedback on process progress and product quality. An exhaust machine with height-adjustable exhaust ports allow for effective removal of process byproducts from the chamber, reducing cleanroom contamination levels. Additionally, VEECO / EMCORE K465i is designed for improved safety and ergonomics with comprehensive diagnostic and safety features as well as an intuitive operator interface. Overall, VEECO K465i is an advanced PECVD reactor that offers a reliable and cost-effective solution for a wide variety of industrial and research applications.
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