Used VEECO / EMCORE K465i #9214755 for sale

VEECO / EMCORE K465i is a robust, reliable and versatile hot-wall, low-emittance, electron-beam vapor deposition (EBPVD) reactor used in thin-film deposition processes. VEECO K465i is equipped with a integrated staging equipment used to adjust and control pressure, temperature, and process gases. This allows the user to deposit very thin films with precision and repeatability over a wide range of materials. EMCORE K465i system utilizes a powerful electron beam source that can reach high deposition rates of up to 5nm/s. The in-situ optical diagnostics unit helps improve the reproducibility and repeatability of the thin-film growth process. The machine also offers high degree of process uniformity for film growth at any point on the substrate and process customization for any specific application. The hot-wall design of K465i makes it very reliable and durable. The hot-wall design also helps to maintain stable chamber temperatures, improving the uniformity of film growth to give you consistent results from run to run. VEECO / EMCORE K465i also utilizes a novel combination of robust refractory material in its chamber construction which helps to reduce any redeposition of material on the substrates as well as supply a high level of thermal resistance and stability. VEECO K465i reactor is designed with a vacuum-sealable chamber and an assortment of ports designed for the installation of process control sensors and other external control devices. The tool also has in-situ process diagnostics to provide real-time film characterization. This helps maintain a consistent film throughout the process as well as providing quick feedback, allowing the engineers to adjust parameters to suit different processing needs. Along with excellent performance, EMCORE K465i is low maintenance and very easy to use. It has no moving parts and the digital temperature control technology makes it simple to operate and set up. The intuitive graphical user interfaces (GUI) control the complete deposition process, from substrate preparation to post-deposition cooling and substrate removal. Overall, K465i is an ideal choice for thin film growth operations for lab or industrial applications due to its robustness, reliability and versatility.