Used VEECO / EMCORE K465i #9227000 for sale

VEECO / EMCORE K465i is a high performance etch reactor designed for use in a variety of fields. It is a low-pressure plasma device that utilizes a combination of gas chemistry and an intensive electron bombardment. This reactor is a hollow-cathode-operated device that offers repeatable, uniform etch profile with superior performance. VEECO K465i is a multi-wafer etch reactor rig capable of processing up to four 3-inch wafers simultaneously. It has a load lock module and a cassette tray for wafer loading and unloading, with an automated drive and an interfaced end-point detector. The reactor is equipped with field emission electron gun construction, and can provide electrostatic shielding at a wafer level. The control of gas flow and the uniformity of etching can be set and adjusted by the user. It is also capable of performing batch deep reactive-ion etching (DRIE). This DRIE creates a negatively sloped sidewall angle with a uniform etch rate in the aspect ratio over a range of pressure and power conditions. EMCORE K465i utilizes an advanced multi-gas control system to reduce the time required for process qualification and reduce maintenance costs. In addition to the multi-gas control, multiple recipes can be stored and used for differing applications. It also features a chemical-free zone and uses an in-line shutter method to control the back pressure from the exhaust. This versatile device features active emissions monitoring, which keeps the system safe and efficient. Its low-pressure platform utilizes an etch barrier and full substrate height control to create uniform etching and minimal timeouts and down-times. K465i is the perfect choice for users looking for a reliable, cost-effective etching solution. Its combination of high performance and ease of use make it an ideal choice for a variety of applications.