Used VEECO / EMCORE K465i #9363426 for sale

VEECO / EMCORE K465i is a radio-frequency (RF) reactive ion etching reactor equipment designed for precision micro-fabrication of advanced electronic devices. This system utilizes a combination of RF power sources, a high-density plasma source, a range of etching gases, and computer-controlled precision hardware and software to deliver high-precision, high-resolution etching performance on a variety of materials such as glass, silicon, sapphire, and other polymers. VEECO K465i is based on a hybrid, magnetically enhanced, microwave plasma process that delivers high quality etching with low PMMA erosion and minimized micro-loading. It is equipped with an advanced plasma source that employs a controlled polarity conversion mechanism to create a robust, high-density plasma at both the plasma source and substrate chamber. The source has been engineered to provide a high uniformity and a high chemistry selectivity, allowing for optimal etch profiles. EMCORE K465i has a high repeatability rate, meaning that multiple etching processes can be run on the same workpiece to achieve uniform results. It also has the ability to etch large areas with low variation across the etch area. The unit's environmental controls allow for precise pressure and temperature levels, while a robust gas management machine supports automatic gas mixing to achieve the best etch chemistry. K465i is equipped with an advanced computer-controlled hardware and software tool that deliver repeatable, high-precision etching results. The asset is also equipped with a range of RF power sources, enabling the user to etch with different etching gases and set the specific etch parameters. The model also offers a wide range of substrate materials, from standard metals to exotic materials, so that virtually any application can be addressed. VEECO / EMCORE K465i RF reactive ion etching reactor equipment is designed with flexibility and precision in mind. Its advanced hardware and software systems are designed to allow the user to achieve high-precision, high-resolution etching results on a variety of materials. Its robust gas management system and environmental controls ensure the optimum etch chemistry. The unit's range of RF power sources, along with its ability to etch large areas and low variation across etch areas, ensure that this machine is ideal for any micro fabrication application.