Used VEECO / EMCORE K465i #9364537 for sale
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VEECO/Ecore VEECO / EMCORE K465i is a high-performance radio frequency (RF) plasma-based reactive ion etch (RIE) reactor. This equipment is ideal for a wide range of applications such as etching high aspect ratio structures, patterning polymers, etching sapphire, and precision etching of metals. VEECO K465i technology is designed to ensure perfect etching results with precision and quality control. It is based on the latest plasma-based RIE technology, which uses radio frequencies to excite the plasma. The advanced RF formation of the plasma ensures accurate, repeatable etching results. The integrated plasma profile control technology offers precise control over the process. EMCORE K465i is equipped with proprietary EMCORE/Ecore technology for maximum etching uniformity and high-aspect ratio structures. This is due to its unique electrode design, which features an electrode chamber with an angled slot. This provides a much larger etching area. It also comes with the company's patented atomic transport mechanism for efficient, repeatable etching. K465i is designed to operate at a wide range of frequencies and pressures. This range allows the system to process a wide range of materials, such as metals, ceramics, and polymers. The unit is also equipped with advanced audio frequency voltmeters (VFMs) and pressure controllers to ensure proper control and monitoring. VEECO / EMCORE K465i's automated load lock machine provides quick, repeatable processing without any jigs or steps. This tool offers high inrush current capability for rapid etching. The asset can be programmed to work with a variety of wafer sizes and shapes. VEECO / EMCORE/Ecore VEECO K465i is a reliable etch reactor that comes with the latest in etching technology. It is designed for high-speed etching processes with precise processing. It is equipped with features like an angled slot for high-aspect ratio structures, advanced audio frequency voltmeters (VFMs) and automated load lock systems. This makes it ideal for a wide range of applications in etching, patterning, and precision etching.
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