Used VEECO / EMCORE K465i #9411980 for sale

VEECO / EMCORE K465i reactor is a powerful and efficient tool for many research and manufacturing processes in materials science, nanotechnology, and an array of other fields. It is a state-of-the-art plasma etching system, designed to provide precise and repeatable control over parameters such as etching rate, anisotropy, selectivities, and end-point control. A compact, vertical-type reactor, VEECO K465i is ideal for many commercial and laboratory applications, as it offers a flexible configuration with up to three process- and source-modules, a load lock, and integral turbo pumping and vacuum monitoring capabilities. EMCORE K465i is a reactive ion-etching (RIE) system and primary reactions such as Ar plasma, SF6 plasma, oxygen-plasma, and others they can be deployed to etch a variety of materials. The unit offers excellent control of process, recipe design, source material selection, and main pump start-up. A graphical user interface, panel view display, and programmable logic controller provide a comprehensive control interface for the chemistry-control aspects of etching. The components of K465i include an electrostatic chuck, keep-out shields, and an integrated ion-beam source. The internal components are designed to support etching processes of <20KV, with a maximum etch rate of up to 32nm/min, and features that allow for high resolution etching. The electrostatic chuck and keep-out shields help to ensure process repeatability and precision and reduce component loading times and movement. VEECO / EMCORE K465i provides a wide array of material deposition services, including chemical vapor deposition (CVD), physical vapor deposition (PVD), and evaporation. These services can be used to deposit a wide range of materials, including metals, alloys, dielectrics, and semiconductors. The processes also offer excellent control over etching anisotropy, feature control, and precision. In addition to the etching and deposition capabilities, VEECO K465i offers a number of options to optimize the process, including a load lock, dedicated ion source, and photo-ionization capabilities. The load lock allows for repeatable and controlled sample loading, while the dedicated ion source provides higher etch rates and improved repeatability. The photo-ionization capabilities are designed to improve the process resolution and improve sample compatibility. Overall, EMCORE K465i is an excellent choice for a wide range of research, manufacturing, and industrial applications. Its flexible configuration and wide array of capabilities make it a highly versatile machine, with the potential to transform the way materials are engineered and used. Combined with its excellent features, control capabilities, and repeatability, K465i is a powerful tool for anyone looking to increase the efficiency and accuracy of their processes.