Used VEECO / EMCORE K475 #9315631 for sale

VEECO / EMCORE K475 is an electron beam (e-beam) ion implantation reactor specifically designed for the production of semiconductor and optoelectronic components. It enables high-precision and large-area doping of substrates with a wide range of ion beam energies and intensities ranging from 10 keV to 40 keV and from 1 mA to 4 mA, respectively. VEECO K475 is designed with a split vacuum chamber, whereby the top chamber contains the ion source, accelerating structure, and an injector gun; and the lower chamber houses the beam line, sample loading station, and target platform. It also includes a pre-ionized, 90° bend to the beam line which permits the operator to precisely adjust the current and voltage of the beam. EMCORE K475 is designed to provide maximum beam uniformity across the target substrate, thereby ensuring uniform implantation. It is equipped with an adjustable collimator to precisely focus the beam on the substrate. Additionally, the self-calibrating monitor system controls the beam current, beam intensity, and beam uniformity to ensure an optimal, repeatable, and consistent implantation. In order to prevent deposition of unwanted ions and reduce contamination, K475 features contamination control capabilities. It has an ion shutter and sealed chamber lid which permit the operator to control the internal pressure of the chamber. Additionally, an optional ion getter pump is available for additional post-processes cleaning of the chamber. VEECO / EMCORE K475 is a flexible tool for the production of high-demand semiconductor and optoelectronic components. It is fast, efficient, and precise, and is capable of producing high-accuracy implants with up to 1 μm resolution. Its robust design, sophisticated control, and extreme precision makes it suitable for industrial and scientific applications in semiconductor, optoelectronic, aerospace, and military applications.