Used VEECO / EMCORE TurboDisc E450 LDM #9119474 for sale

VEECO TurboDisc E450 Low-Density Metal (LDM) Reactor is a commercial tool used to physically vaporize metals for use in semiconductor devices and structures. This high-performance reactor operates in a high-vacuum environment and uses microwave energy for heating, vapor deposition, and oxidation. The process begins by loading a 'feedstock' of required metals into the reactor's quartz wafer susceptor, which is then capable of achieving very high temperatures in a precise, consistent manner. The E450 LDM reactor is capable of deposition rates up to 5nm/s under dynamic operation and uses either radio frequency (RF) heating or direct current (DC) heating to achieve these high temperatures. On top of that, the constant deposition parameters within the TurboDisc design enable users to repeat the same deposition process to create structures that are identical in terms of uniformity. The advanced in-situ cleaning technique included with the E450 LDM reactor equipment plays an integral role in the cleaning of the quartz wafer susceptor and other components of the system to prevent any type of contamination from occurring. This in-situ cleaning technique utilizes a source of chlorine gas and nitrogen gas in a process that ensures the highest quality materials are deposited in the desired layers. The E450 LDM reactor also offers the convenience of efficient electrical isolation. This means the reactor can function in a stable manner regardless of any changes that occur in the external environment, ensuring the highest quality results are consistently achieved. In addition, the E450 LDM reactor does not require frequent servicing and upkeep, meaning users can operate the reactor for extended periods of time without running the risk of the unit breaking down. The machine also includes a re-circulating cooling tool to keep the entire asset working optimally at all times. EMCORE TurboDisc E450 Low-Density Metal (LDM) Reactor is an easy to use, high-performance tool that is well-suited for a wide range of applications that require the vaporization of metals. Its advanced in-situ cleaning method, high deposition rates, and electrical isolation make it an ideal choice for those looking for a consistent and reliable deposition model.