Used VEECO / EMCORE TurboDisc K465i GaN #9375122 for sale

VEECO / EMCORE TurboDisc K465i GaN is a next-generation deposition reactor designed specifically for GaN material applications. It is a high-performance, ultra-high-power platform for growing materials optimally for these applications. Featuring advanced deposition technologies and an optimized reactor platform, it provides industry-leading rates of deposition and unbeatable film uniformity and process control. The K465i employs state-of-the-art inductively coupled plasma technology, a key tool for optimizing advanced material processing. This type of plasma source is highly efficient, and is ideal for material deposition processes, like those used for GaN applications. It provides high-density plasma with faster ionization than conventional sources and improved ionization stability, enabling precise deposition of GaN thin films. The K465i also features variable frequency control of the plasma source, allowing users to precisely control the energy of the molecules being excited and ionized in the plasma. This enhanced control allows for precise control of the deposition process, enabling incredibly uniform and highly-aligned molecular structures. Additionally, the high-power source in the K465i enables high deposition rates that are essential for optimizing production-scale applications. The K465i is equipped with a Hot-Walled Dual-Showerhead Configuration, allowing two plasma source configurations and independently controlled deposition rates. This enables independent and simultaneous deposition of films and their layer-dependent parameters at high deposition rates. Additionally, the dual-showerhead design can be used for engineering crystalline structure with greatly enhanced feature control of both layer stack structure and layer thicknesses. The K465i is designed to be highly efficient even in challenging conditions. It is capable of operating at high temperatures, reducing the production cycle time and lowering operating costs. It has an advanced cooling system that eliminates the need for a vacuum pump, further contributing to its efficiency. Overall, VEECO TurboDisc K465i GaN is a next-generation deposition reactor designed specifically for GaN applications, providing superior performance and process control. It uses advanced technologies like inductively coupled plasma, variable frequency control, and a hot-walled dual showerhead configuration to maximize the efficiency of the deposition process and achieve high rates of deposition with exceptionally uniform film quality. This makes it an ideal platform for GaN material processing.