Used VEECO / EMCORE TurboDisc K465i GaN #9375129 for sale

VEECO / EMCORE TurboDisc K465i GaN is a high-performance plasma reactor designed for the production of high-quality thin films. The reactor enables the deposition of high-quality, high-temperature uniform thin films over large areas in a reproducible process. The TurboDisc utilises advanced power sources to generate a DC or pulse powered plasma. This plasma is fed into a unique and highly uniform Thermal Reactive Disc (TRD) source, allowing for better control of the plasma properties. The reactor is designed to maintain consistent power output over an area of up to 20 cm2, minimising film non-uniformity. The TurboDisc's high-performance features means it can process any number of gases used in plasma enhanced chemical vapor deposition (PECVD) and low temperature deposition (LTD/ALD). It can also be used to introduce a variety of dopants or catalysts into the deposition process, enabling process control. The reactor is equipped with a very precise temperature control and uniformity system. This allows for precise and reproducible thin film deposition with excellent thermal uniformity across the large area. The temperature sensor is built into the sensing element, providing an accurate and real-time readout of the process. The TurboDisc also has an embedded control system that allows for full integration and process control. It can be programmed with a wide range of parameters for automated, repeatable production of films. The ability to accurately measure and control the critical process parameters ensures the films will be of high-quality and consistancy. The TurboDisc is also equipped with advanced safety features that ensure rigorous safety standards and ensure repeatable, uniform, quality output. This allows the reactor to be safely and consistently operated in any production environment. Overall, VEECO TurboDisc K465i GaN is a powerful and reliable reactor that offers enhanced process control, uniform temperature control, and reliable process reproducibility. It is designed to deliver high-quality, uniform thin films with repeatable yields. The robust and reliable design ensures a safe and efficient deposition process.