Used VEECO / EMCORE TurboDisc K465i GaN #9375133 for sale

VEECO / EMCORE TurboDisc K465i GaN Reactor is an advanced plasma processing system designed for the deposition of thin films for semiconductor device fabrication. It is a high-throughput, high-throughput-rate system that consists of a linear-motor, multi-chamber source-shutter configuration with a state-of-the-art gas-flow controller and temperature controller. The reactor uses a proprietary process that combines a unique showerhead design and optimized plasma chemistry to deliver very uniform and conformal films with superior edge-profile and exceptional substrate-temperature control. The K465i utilizes a high-power GaN Radio Frequency (RF) source with fully-integrated matching network, and can operate at either a constant 25 MHz or variable frequency up to 60 MHz. With its powerful RF generator, the K465i can generate plasma for various deposition processes, including oxide, nitride, and metals, with low temperature and high throughput. The system utilizes innovative plasma sources, including the proprietary TurboDisc technology, to ensure high uniformity and conformality over large substrates. The integrated matching network provides optimized power delivery and ensures uniformity and repeatability of deposition results. The uniformity, repeatability, and temperature performance of the K465i enable it to obtain process results that are comparable to those achieved with more expensive and complex technology. In addition, VEECO K465i is designed to be as scalable and flexible as possible. It can be used in single-tool configurations for small-to-medium batch projects, as well as multi-tool configurations for larger pilot runs. Its modular construction and flexible design allows it to easily integrate with other equipment such as robot handlers, metrology, or custom fixtures for rapid development. Furthermore, the use of multiple chambers and custom recipes enable the K465i to create different types of films for multiple applications at the same time, providing users with the ability to quickly and efficiently meet their production needs. In summary, VEECO TurboDisc K465i GaN Reactor is an advanced plasma reactor that combines innovative plasma source technology with unparalleled uniformity, repeatability, and temperature control for the deposition of thin films for semiconductor device fabrication. Its scalable and flexible architecture allows customers to quickly and easily integrate it into their production lines, while its powerful RF generator enables it to produce various deposition materials and processes with superior quality.