Used VEECO / EMCORE TurboDisc K465i GaN #9409670 for sale

VEECO / EMCORE TurboDisc K465i GaN is a high-performance MOCVD (metal-organic chemical vapor deposition) reactor that is specially designed for the deposition of Gallium Nitride (GaN) layers. This is an ideal tool for the development of advanced GaN-based optoelectronic devices such as lasers, heterojunction bipolar transistors (HBTs), and other electronic devices. The equipment is designed with a powerful laser and chamber design to ensure reliable uniformity for producing large diameter wafers with high yields. VEECO TurboDisc K465i GaN reactor features a fast rotating electro-mechanical shutter for substrate protection that allows for rapid wafer cell and quick wafer changes. This is combined with a fast purge and pump down operations for increasing processing speed and throughput. In addition, the reactor has a gas blending package and a specialized gas control system for precise gas delivery. This allows for the flexibility to optimize the process parameters such as reactor pressure, temperature, and gas flow rates. EMCORE TurboDisc K465i GaN reactor is equipped with an advanced robotic substrate handling and shifting unit. This features a small footprint, high-speed operation, and small and large wafer loaders. Furthermore, the machine has a customizable and intuitive GUI (Graphical User Interface) that facilitates easy operation and recipe format. TurboDisc K465i GaN reactor has a highly efficient turbomolecular pump to reduce pump down time, provide excellent vacuum stability and longer pump life. It is also equipped with a fast direct cooling tool, which can be installed on either side of the reactor chamber. This cooling asset helps the user keep the chamber cool even in demanding operating conditions. Furthermore, the fast cooling model can also be used for thermal annealing and wafer bonding. VEECO / EMCORE TurboDisc K465i GaN reactor is optimized for long run uniformity and high yield operation, with excellent substrate uniformity, low defect density, and an excellent production yield. In conclusion, VEECO TurboDisc K465i GaN reactor is a highly advanced and reliable equipment for producing high-performance GaN-based optoelectronic devices, allowing for reliable and repeatable results.