Used VEECO / EMCORE TurboDisc K465i #9223149 for sale

VEECO / EMCORE TurboDisc K465i is a high power, RF driven chemical vapor deposition (CVD) reactor. It is a semiconductor fabrication device designed for use in growing thin films, such as SiO2, SiN, and more recently Graphene. The K465i utilizes a patented "elevator" design, allowing for layer-by-layer growth of semiconductor materials. The physical construction of the K465i is an "elevator" assembly that allows for the wafers to be placed inside the chamber and the entire chamber to be raised and lowered — thus depositing layers. The TurboDisc utilizes electron cyclotron resonance (ECR) to generate radicals and active species at temperatures ranging from 150°C to 650°C. It brings a considerable thermal budget to the deposition process and adds a range of new chemistries to the repertoire of what can be processed and controlled in a deposition reactor. To capitalize on this range of temperature, ECR uses two stages of magnetrons. The Dual Magnetron stage allows for plasma generations at the wafer surface with a main and bias ring controlled independently. It also has an X-Y steering capability which simplifies substrate loading. The K465i's standard safety features comply to semiconductor safety regulations and are 12X greater than the industry standard. The chamber containment, pressure relief valve, differential pressure vacuum gauge, vent line and motorized manually operated shutoff rates adhere to semiconductor standards. The K465i employs FEST, a process control system designed to accumulate and modularize recipes, monitor process parameters and result in high process repeatability. FEST classifies related recipes into folders for ease of retrieval. Relevant process data such as gas flow, pressure, vacuum, wafer temperature, substrate biasing, are automatically measured and recorded in a straightforward manner and can be easily correlated with results for process optimization and improvement. From a manufacturing standpoint, the K465i has proven itself in the semiconductor industry for its ease of operation, high throughput, and its good process control. Its "elevator" design reduces substrate loading time and helps to achieve high yields. The dual magnetron feature increases plasma intensity while decreasing electron energy and providing excellent plasma profile uniformity. The integrated FEST process control package provides comprehensive analysis and refined optimization of process recipes. All these features, together with its excellent safety features, make the K465i an ideal tool for semiconductor fabrication applications.