Used VEECO / EMCORE TurboDisc K475 As/P #9375083 for sale

VEECO TurboDisc K475 As/P is an advanced high-rate epitaxial reactor for the fabrication of thin crystalline films. The reactor utilizes an inductively coupled plasma (ICP) source and a combination of two axes and four-chuck stages for simultaneous action to provide unique equipment performance and flexibility. The chamber utilizes a triflange design for improved pumping efficiency and a unique ceramic base that reduces effects of thermal gradients and non-uniform RF loading which allow for improved uniformity. The turbo power of the ICP enables sustained ultra-high deposition rate of up to 10nm/min, ensuring repeatable film thickness and high deposition uniformity. The two axes chamber allows for large area uniformity with fast wafer to wafer exchange times. The four-chuck multi-station process enables production of large substrate area while maintaining uniformity. The K475 As/P is equipped with efficient wafer cooling and thermal isolation through strategically spaced process shims and isolation pods that minimize drift and allow for stable thermal performance. The system is also designed with high-end semi-automated material handling systems which increase throughput and enable easy operation while providing a cleaner environment. The unit is fully computerized with touch-screen interface for easy monitoring, controlling and recipe maintenance.It offers a unique combination of real-time process feedback, data recording, and graphing program to enhance yield performance. It also includes advanced processes such as Cat-CVDTM, BoostTM, ALD, MOCVD, PCR, and PECVD, which enable fabrication of high quality films. In addition, the machine also includes remote access maintenance and calibration with self-diagnostics for parts fatigue, start up delay time, and much more. With all these features, the K475 As/P offers a reliable and efficient fabrication solution for a variety of challenging semiconductor applications.