Used VEECO / EMCORE TurboDisc K475 #9372880 for sale
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VEECO / EMCORE TurboDisc K475 is a reactor designed for the epitaxy of compound semiconductor materials. It is driven by a rotatable disc used to move a substrate through the reactor. The high precision X-Y stage allows for precise and repeatable movement of the substrate in two planes for controlled deposition. The reactor has a source-to-substrate distance of up to 5mm and a 20" maximum substrate diameter. The process chamber is designed to be hermetically sealed with a diffusion-resistant equipment to ensure the cleanliness of the reactor. Heating elements within the chamber provide a consistent temperature for the substrate surface and deposition. The system features an advanced two-source supply, with an internal gas manifold unit intended to permanently store, manage, and deliver up to four gases, through three independent feed strips. The heating machine allows for programmable temperature conditions and uniform temperature control, providing a high degree of accuracy for reliable results during the growth process. The reactor is also designed for easy, low maintenance operations. It features an intuitive touchscreen interface to connect the computer and access real-time machine control operations. This interface includes built-in safety features, such as automatic shutoff and alarm systems. Finally, a variety of sensors are employed to monitor various parameters throughout the entire process. These sensors can be used to detect and manage deposition rates, gas flow rates, chamber temperature, substrate temperature, process vacuum, and gas composition. Overall, VEECO TurboDisc K475 is an advanced reactor designed for the epitaxy of a wide range of compound semiconductor materials. Its high precision stage, source-to-substrate distance, temperature control, two-source supply, and advanced safety features ensure a repeatable and reliable process with low required maintenance.
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