Used VEECO / EMCORE TurboDisc K475i As/P #9231840 for sale

VEECO TurboDisc K475i As/P reactor is a medium power device providing high-quality, versatile deposition performance in semiconductor and opto-electronic applications. It is a four-zone quartz boat reactor, which enables sophisticated high-rate deposition. The reactor is optimized for deposition of materials such as Si, SiC, Ge, GaAs, AlN, and GaN, as well as optical coating applications. The reactor is equipped with an advanced active source power supply that allows users to vary the source power from 10 to 450 Watts per zone, allowing for high-rate deposition of materials onto various substrates. In addition, the K475i As/P utilizes a pulsed power supply capable of delivering pulses up to a 100 kHz frequency for high-repetition rate deposition. Moreover, the unit is also capable of performing rapid thermal annealing. The reactor also features two independent gas control systems, which enable precise flow control of process gases. This allows users to independently control the process chamber pressure, and the amount of deposited gas. In addition, the K475i also has an integral active cooling arrangement, which helps to maintain the substrate temperature and maintain the integrity of the deposition process. The integral temperature control also helps to reduce the temperature during cutting-edge high speed applications. Furthermore, the retractable shutter system provides dynamic control of the deposition rate and angle. The accelerator magnetic field is fully adjustable and can be programmed to ensure optimized system performance for a specific application. Furthermore, the K475i has a comprehensive integrated diagnostic system which includes the ability to measure RF power, Resonator voltage, Frequency and Temperature. Combined, these features make the K475i a powerful and reliable materials deposition device.