Used VEECO / EMCORE TurboDisc K475i As/P #9246072 for sale

VEECO TurboDisc K475i As/P is a high-power, direct current (DC) powered cathodic arc plasma reactor which is designed for high-rate deposition or etching of a broad range of materials. This reactor utilizes a gas injection system to create a highly energetic plasma by which material is reactive with environmental agents. The reactor features a Direct Negative Input (DNI) power supply which enables stable and precise deposition and etching. The TurboDisc K475i As/P consists of a chamber, electron beam gun, electron collector (as electrode) and anode. EMCORE DC Power Supply coupled with the electron beam gun generates a small, intense electron stream which strikes the surface of the workpiece (substrate). This energy is then transferred to the arc and the gas injected into the chamber from the gas injection system. The gas is characterized by being largely ionized; the ionized gas forms a plasma which accelerates deposition rate and reduces process temperature. The TurboDisc K475i is capable of consistent rate of deposition or etching at higher rate than with conventional plasma technologies. Its high power density parameters support complex multi-layer deposition as well as success in high density etches with minimal heat or strain effects. The power supply also includes proprietary features, such as Advanced Power Management Logic (APML), to control the precise power required for each cycle. This also enables full compatibility with wide range of precursor sources as well as substrate requirements. VEECO / EMCORE TurboDisc K475i As/P is suitable for a wide range of precision coating and surface finishing applications, including semiconductor and MEMS fabrication, solar cell deposition, and displays. The reactor is ideal for research and development or production scale tasks, due to its flexibility and ease of use. Additionally, the system features wide operating parameters, adaptability to a wide range of precise power levels, as well as advanced intelligence, control, and safety features for trouble free operation. This reactor therefore offers the highest quality and consistency, allowing for higher throughputs while at the same time delivering superior cost per wafer.