Used VEECO / EMCORE TurboDisc MaxBright #293667120 for sale

VEECO / EMCORE TurboDisc MaxBright reactor is a powerful semiconductor processing tool designed for efficient deposition of thin films and nanostructures over large areas in a short period of time. It is the first commercially available fast, wide, and thin-film deposition system that uses an advanced tri-disc chamber design to maximize throughput and performance. The TurboDisc relies on electron beam (EB) evaporation technology to deposit materials on wafers or substrates with double sided 3D conformal coverage. The EB gun operates at high RF frequencies to rotate multiple electron beams with varying orbitals in order to reach the desired target on the substrate. The result is faster deposition than traditional single-source deposition methods, allowing for significantly fewer defects and damage to the substrate. The chamber has a clean and modular design so the machine is easy to maintain and reconfigure. It has a 13" substrate stage and can fit any pattern of over 130 wafers to be processed in a single cycle at speeds up to 30 wafers per minute. The system also has a substrate-to-showerhead distance of 12.7" for wide area deposition, and a process chamber height of 15.75" that allows the deposition to occur in a wide range mass production of throughput and maximum process flexibility. The TurboDisc features a high-resolution monitor and a user-friendly graphical user interface (GUI) with multiple process control options such as dual-band and multi-layer deposition. It also has a high speed algorithm control and recipe management for tracking multiple jobs and recipes. The software also allows for remote management of systems and monitoring of process parameters. The TurboDisc utilizes the latest in hardware technology and is the most advanced reactor in the industry for high-volume production of thin-films and nanostructures. It is designed to increase throughput and minimize material loss ensuring the highest yield per wafer and highest return on investment for any number of large area deposition applications.