Used VEECO / DEKTAK K465 #9229665 for sale

VEECO/KDEKTAK VEECO / DEKTAK K465 reactor is designed to deposit layers of materials for thin-film deposition applications in the semiconductor industry. It provides precise high-resolution control of layers as thin as 0.1nm to create critical three-dimensional structures. VEECO K465 reactor features a versatile dual transport bellows capable of accommodating different types of substrate transfer mechanisms such as robot, manual, and single-wafer-indexer configurations. The transport bellows also allows precise and consistent integration of multiple reactor components. The advanced bellow design ensures a clean and stable environment within the reaction chamber, ideal for producing high-quality layers. The vacuum system of DEKTAK K465 reactor also contributes to its efficient performance. Built with a turbo pump with diffuser and liquid nitrogen shield cold trap, it produces high vacuum levels and reduces the pump-down time. This makes it possible for the reactor to start working quickly and complete sequential deposition runs without interruption. K465 also offers advanced substrate heating capabilities. It has two different substrate zones, namely low- and high-temperature zones, for accurately controlling substrate temperature. Additionally, the zones feature a thermally isolated susceptor for uniform heating of the substrate. The reactor has intricate control logic that ensures accurate and stable control when ramping temperatures. Overall, VEECO / DEKTAK K465 is a precision thin-film deposition system ideal for manufacturing fine three-dimensional structures. Its reliable dual transport bellows provide precise deposition control and its vacuum system guarantees consistently clean environments. Furthermore, its substrate heating capabilities ensure uniform temperatures around the substrate. Altogether, these features make it an excellent tool for producing advanced forms of semiconductor technology.