Used VEECO K475 #9364542 for sale

VEECO / DEKTAK K 475 Reactor is a precision, high-performance reactor for advanced materials research. It is designed for the rapid characterization of the electrical properties of thin films, from silicon, gallium arsenide, GaN, and many other materials. This reactor offers incredibly powerful, easy-to-use features to permit reliable, repeatable results. VEECO K 475 Reactor is a direct current (DC) sputtering reactor and is well-suited for the atomic deposition of thin films, including metals, oxides, and nitrides, as well as other dielectric materials. Its performance is enhanced by its unique DC dual-magnetron sources for sequential deposition and etching. It also features an electrical measurement subsystems that is sensitive and fast, enabling extremely accurate sheet and contact resistance measurements. The user can also select from a variety of substrate holders, ranging from standard wafers to partially mounted substrates. The reactor features advanced, automated motion control for optimum accuracy and repeatability. It can accurately position the wafer to within 3 μm and achieve fine-grain control of the wafer's surface conformal to 5Ω/sq. The reactor is also equipped with a high-performance deposition control system, ensuring perfect performance by automatically controlling the deposition rate, homogeneity and process accuracy. The reactor's sputter duty cycle can be adjusted for an optimal rate of deposition and an optimal balance between deposition and etching rates. The primary purpose of DEKTAK K475 Reactor is to create high purity thin films for advanced materials research. It paves the way to the development of increasingly efficient and reliable advanced materials, providing both researchers and industry practitioners with powerful tools for evaluating their materials. This reactor provides an ideal platform for the study and fabrication of novel, high-precision multi-layer films for applications in optoelectronics, telecommunications, and data storage.