Used VEECO Nexus PVD-MT #9233171 for sale

VEECO Nexus PVD-MT (Physical Vapor Deposition - Multi-Target) is a cutting-edge production reactor designed to efficiently produce high-quality films for a wide range of technologies, including those used in optoelectronics, photovoltaics, flat panel display, and other industries. Utilizing advanced computer controller technology, the PVD-MT can deposit a wide range of metal, metal oxide, and non-metal films, allowing users to customize their products with various materials of a desired thickness and smoothness. The PVD-MT's proven flexibility makes it an excellent choice for a variety of production needs. The PVD-MT is based on a modular metal-ceramic chamber design and is driven by a powerful electric power supply. Multiple targets are placed along the circumference of the chamber, which can heat up to several hundred degrees Celsius. The chamber can also be configured to hold up to four process gases, enabling deposition of oxides, nitrides, and other materials. The advanced computer controller optimizes the process parameters, thereby providing improved uniformity and reproducibility. One of the notable features of the PVD-MT is its high control accuracy and uniformity of the process temperature. To ensure satisfactory results, the advanced computer controller allows users to utilize several pre-set recipes to adjust the various process parameters. For instance, users can use the speed controller to regulate the travel of the target so as to achieve better control over the process. The PVD-MT is designed for easy maintenance and cleaning with minimal user intervention, whereby utilizing dielectric isolation and shielded quartz RF electrodes to ensure effective and efficient operation. Moreover, its advanced design ensures the longevity of the components. The adjustable upper and lower baffles in the chamber also provide excellent particle filtration for efficient operation. Overall, Nexus PVD-MT is a reliable and efficient production reactor that offers excellent control over process parameters. Its efficient design also allows users to deposit a variety of materials, while the adjustable process recipes enable users to achieve high levels of accuracy and uniformity when producing films. It is an excellent choice for any industry that utilizes PVD technology.