Used FEI CLM-3D #293670547 for sale
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FEI CLM-3D is a scanning electron microscope (SEM) designed for characterization of surface topography and microstructural features of high resolution samples at nanoscale resolution. The microscope features a large field of view and extended working distance, making it ideal for capturing detailed features as well as large-scale overviews. CLM-3D boasts a true colour chamber allowing for the high-precision imaging of nanoscale structures. This is especially beneficial when imaging samples which require structural elements to be analysed optically or chemically. The true colour chamber also enables the user to obtain three-dimensional (3D) images that can be viewed interactively and also saved as digital files. FEI CLM-3D utilizes high-resolution optics to ensure accurate imaging of sample surfaces. The objective lens has a long working distance, allowing for larger depths of field while still providing satisfactory imaging resolution. Additionally, the objective also features a collection angle of up to 30 degrees, enabling tilted view imaging and determination of 3D shapes of nanoscale features. CLM-3D also features faster acquisition speed, with the possibility to capture thousands of images per second. This allows for quick analysis of samples, greatly increasing productivity. FEI CLM-3D includes multi-functional software which facilitates automated imaging, analysis, and publication of information. The software is equipped with several features, including automated stitching, multi-level slicing, and peak/trough intensity analysis. The modular design of CLM-3D offers a range of configurations to choose from, depending on the application being used. This modular design aids in reducing downtime, electrical interference, and optimizing performance. All in all, FEI CLM-3D is a high precision scanning electron microscope which provides excellent imaging features to nanoscale features. It is suitable for a variety of applications including material science research, nanomaterials characterization, and semiconductor analysis.
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