Used HITACHI S-2700 #293751449 for sale

HITACHI S-2700 is a high performance scanning electron microscope (SEM), designed for a wide range of applications. S-2700 is capable of producing high resolution images, at resolutions up to 2 nanometers. This small resolution is achieved through the use of high-performance electronic optics. The equipment also features a highly efficient cooling system as well as high-speed data acquisition. HITACHI S-2700 has a unique combination of features, such as a high-performance built-in focusing unit, an automated specimen transfer machine, an integrated sample chamber and stage, and a special double-angle detector tool with simultaneous angle detection. This allows users to quickly acquire images of both standard materials and those with complex structures. The high-resolution image is obtained even in cases with complex samples. S-2700 also possesses significant capabilities for automated microanalysis. Through the use of advanced analytical software, the instrument can quickly obtain surface element distributions and quantitative microanalysis of up to 40 points on the sample. The software also allows for accurate parallel and cross-sectional analysis, with variables such as geometry, aspect ratio, and point distance. The asset also supports advanced imaging and grain boundary work. The internal built-in particle-optical detector can be used to acquire detailed images, even of grain boundaries, at resolutions up to 0.2 nm. The unique particle-optical design allows for detailed imaging of grain boundaries while maintaining precision and high specificity. HITACHI S-2700 has a robust design, providing excellent reliability; even in harsh environments. It has a wide range of operating conditions, including cold climates and high-vacuum use, and is able to operate in temperatures up to 55°C. In addition, the instrument is equipped with a number of safety features, including circuit breakers, temperature-limiters and a patented safety mechanism. S-2700 is highly versatile, allowing users to perform a wide range of imaging, analysis and inspection tasks. It is particularly well-suited to tasks involving semiconductor inspection, structural analysis of nanostructures, failure analysis and research into advanced materials.