Used HITACHI S-3400N Type II #293799289 for sale

ID: 293799289
Scanning Electron Microscope (SEM) Magnification range: 5x to 300000x Resolution: Type: SED Size: 3.0 nm Power supply: 30 kV Type: BSED Size: 4.0 nm Variable pressure Power supply: 30 kV Chamber and stage: Specimen size: up to 200 mm X Traverse: 80 mm (Type I), 100 mm (Type II) Y Traverse: 40 mm (Type I), 50 mm (Type II) Z Traverse: 5 to 35 mm (Type I), 5 to 65 mm (Type II) Rotation: 360° Tilt range: -20° to +90° Sample height: 40 mm (Type I), 85 mm (Type II) Manual motorization 5-Axis Detectors: SE Detector: everhart-thornley BSE Detector: five-segment solid-state Electron source: pre-centered tungsten hairpin Accelerating voltage: 300 V to 30 kV Vacuum system: Turbomolecular pump: 210 liter/sec Rotary pump: 162 l/min Variable pressure range: 6-270 Pa Chamber pump down time: ~90 Seconds Automatic functions: Brightness/Contrast Control (ABCC) Focus Control (AFC) Stigmator and Focus control (ASF) Filament Saturation (AFS) Beam Alignment (ABA) Beam Setting (ABS) Objective Aperture Alignment (AAA) Auto beam blanking Display and imaging: LCD Monitor, 19" Signal mixing (BSE, SE, ESED) Display mode: Standard, Full screen, Real-Time dual image Scan mode: TV Rate, Fast scan, Slow scan, Photo scan, Reduced area scan Image saving and processing: Pixel resolutions: 640 x 480 mm, 1280 x 960 mm, 2560 x 1920 mm, 5120 x 3840 mm Frame integration: 2 to 1024 Pseudo color Digital zoom Contrast/brightness Cropping Resizing Gamma control Edge enhancement Measurement and annotation: Text Graphics Data edger 3D Birds-eye view Operator assist: Stage memory (Type II): up to 200 positions Image navigator 3D Maintenance videos Magnification presets Power: Auto transformer: 100–220 V, Single phase, 2 kVA Rapid start: 6 min Anti-vibration system.
HITACHI S-3400N is a scanning electron microscope (SEM) designed for use in a wide range of research and industrial applications. The instrument features a high resolution field emission gun (FEG) electron source with an imaging resolution of 0.8 nm and a high point-to-point resolution of 0.17 nm. This tool provides superb imaging and analytical capabilities, allowing users to effectively observe particles, crystalline structures, microorganisms, and other small objects. HITACHI S-3400 N is equipped with an automated wafer and mask mapping capability allowing for the automatic alignment of sample surfaces, such as semiconductor wafers. Allowing for rapid and precise analysis of integrated circuit structures and photomasks, this automation greatly increases the efficiency of the mapping process. Once a sample is aligned, S 3400 N provides 5nm filter-free imaging and video-rate imaging speeds reaching 10 Hz. Additionally, the instrument offers an integrated scanning and spectroscopy subsystem, which allows for both imaging and spectrometer analyses simultaneously. This combined scanning and imaging capability is ideal for users who require both in order to evaluate sample composition, structure, and properties. An integrated Cs-corrected secondary electron detector and a backscatter electron detector are also included, allowing for superior imaging performance in a variety of imaging modes. Furthermore, S-3400 N incorporates an advanced energy dispersive X-ray (EDX) spectrometry system that provides quantitative elemental analysis with a 0.1% accuracy. Characterization of a variety of materials and structures can be completed by analyzing the energy associated with deflected X-ray particles. The device is designed to provide users with utmost precision and control over the sample's atmosphere during analysis, thereby improving data quality. The combination of an electron beam, an EDX detector, and an environmental control system enable users to accurately measure and analyze sample properties with greater fidelity. Overall, the combination of sophisticated analytical capabilities and exceptional imaging performance make HITACHI S 3400 N a powerful scanning electron microscope for use in research and industrial laboratories. Its superior performance and superior dynamics enable users to accurately and effectively observe and analyze a variety of objects while providing exceptional resolution and accuracy.
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