Used JEOL JWS 2000 #293621661 for sale

JEOL JWS 2000
ID: 293621661
Wafer inspection system.
JEOL JWS 2000 is a scanning electron microscope (SEM) designed for advanced imaging and analysis. It is an imaging tool that combines the power of a field-emission SEM with the latest technologies to deliver high-resolution images of nano-scale information. This makes JWS 2000 an ideal instrument for characterizing the properties of materials from surfaces to the submicron level. JEOL JWS 2000 is equipped with a field-emission source for precise imaging. This source delivers a high level of resolution, coupled with low accelerating voltage and low noise. High resolution is further enhanced with the latest low-noise detectors, allowing precise detection of even the smallest features. JWS 2000 also features a large working chamber and a wide voltage range, allowing users to probe large samples without sacrificing resolution. JEOL JWS 2000 performs both imaging and analytical applications in one platform. It is equipped with a range of advanced analytical tools, including energy-dispersive X-ray (EDX) spectroscopy, backscattered electron (BSE) imaging, and cathodoluminescence (CL). EDX provides elemental and chemical composition information while the BSE detector and CL allows imaging of material properties from both the surface and sub-surface of the sample. JWS 2000 also provides a range of imaging metrics, such as contrast, aspect ratio, and line width. JEOL JWS 2000 offers a range of automated features for increased ease-of-use. It has an auto alignment system for precise beam placement, an automated sample changer for quickly processing multiple samples, and automated stig and tilt control for accurate image acquisition and analysis. In addition, JWS 2000 supports remote access via both a client/server and web interface. This allows users to operate the SEM from anywhere in the world. JEOL JWS 2000 is an advanced scanning electron microscope designed to provide high resolution imaging and analysis of nano-scale materials and structures. Its field-emission source, advanced detectors, and wide voltage range allow for precise imaging, while its range of analytical tools, automated features, and remote access provide ease-of-use and maximum control. JWS 2000 is the ideal instrument for nano-scale characterization of materials and surfaces.
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