Used LEICA MICROSYSTEMS EBPG 5000 Plus #9228860 for sale
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ID: 9228860
Electron beam lithography system
Beam generation:
Cathode: Thermal field emitter (TFE)
Schottky emitter (SE)
Beam deflection:
Method: Spot beam recorder, vector scan
Large field: 1,000 x 1,000 lbs gm2
Addressing: 20 bits main field, 14 bits sub field
Minimum address increm: 1 nm
Maximum frequency: 50 MHz
Automatic corrections
Stage:
Laser interferometer: 1024 (~0.6 nm)
Writing area: 150 x 150 mm^2
Substrate size: Up to 6"
Miscellaneous
Cassette: 10 Positions
Mechanical steaming system: Piezo active
Operating system: Linux Redhat 5
Pre-alignment microscope
Size / Thickness
3" Square / Mask / 60 mil / 2.5 mm
4" Square / Mask / 60 mil / 2.5 mm
5" Square / Mask / 90 mil / 2.5 mm
6" Square / Mask / 250 mil / 6.35 mm
3"-5" Square / Mask / 60 mil / 2.5 mm
2" Round / GaAs wafer / 300 µm – 500 µm / 1,0 mm
3" Round / GaAs wafer / 500 µm / 1.0 mm
36 m Square / GaAs wafer / 500 µm / 1.0 mm
4" Round / Si wafer / 500 µm / 2 mm
4" Round / GaAs wafer / 600 µm – 700 µm
6" Round / GaAs wafer / 600 µm – 700 µm
Power supply:
High voltage: 20, 50, 100 kV.
LEICA MICROSYSTEMS EBPG 5000 Plus scanning electron microscope is a leading instrument in modern microscopy. It is capable of high resolution imaging and has a range of features that allow for accurate observation and measurement. EBPG 5000 Plus uses an electron beam to scan and image a specimen under study and the electron optics equipment provides excellent image clarity, resolution and depth of focus. LEICA MICROSYSTEMS EBPG 5000 Plus includes sophisticated software that provides image processing capabilities such as surface rendering and 3D reconstructions of a specimen. This advanced software also allows for manipulation of the image properties such as brightness, contrast, zoom and resolution. Further analysis of the image can be achieved through software tools including particle analysis, particle size and thickness measurement. EBPG 5000 Plus also includes several hardware components including an in-column SE detector, an ESEM detector, an ESEM/Q sensor and a dual gun system. The in-column SE detector enables the acquisition of images with high magnification and resolution while the dual gun unit enables simultaneous imaging of two distinct electron emissions. The ESEM detector detects secondary electrons and is used to image non-conductive samples, such as biological matter, while the ESEM/Q sensor improves resolution and contrast for large areas. LEICA MICROSYSTEMS EBPG 5000 Plus also has a vacuum machine to provide the required vacuum environment for the electron microscope to operate. The tool has tolerance for gases, so it can be used to study a variety of samples including atmosphere sensitive specimens. The vacuum pumping asset also provides for minimal vibration of the vacuum enclosure, allowing images to be taken with high resolution and sharp contrast. Overall, EBPG 5000 Plus scanning electron microscope is a powerful tool for microscopy, enabling researchers to observe and measure materials with high resolution, accuracy and speed. Its various features and components allow for a wide range of analysis and examination of specimens, making it an ideal choice for laboratory and research settings.
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