Used PHILIPS / FEI Altura 830 #9329326 for sale

ID: 9329326
Dual beam Focused Ion Beam (FIB) system Sample holder, 6" Piece holder load lock entry, 8" Electron source: Schottky FEG Beam current: 11 nA Ion column: Pre-lens Imaging resolution: 3 nm at 1 kV Ion beam resolution: 5-7 nm TLD UHR, SRH, and BSE Detectors for SEM CDEM Detector for ion (2) Gas chemistry FEI Navigator-KLA / TENCOR Chiller Transformer Stages: X, Y-Axis: 205 x 205 mm 45 mm ZRT Rotation: 360° -5° to 65° ZRT 5-Axis stage motor Turbo pump with XDS 10 Operating system: Windows.
PHILIPS / FEI Altura 830 is a high-performance scanning electron microscope (SEM) designed specifically for advanced metallurgical and nanoscale research. This unit is the world's first true dual-beam SEM, allowing for greater functionality and precision in material characterization. The SEM is equipped with a high-resolution field emission gun (FEG) for enhanced imaging capability, with image resolution of fewer than 40 nm at 1 kV accelerating voltage for optimum precision characterization. The Altura's true dual-beam capability allows for a variety of imaging techniques, including electron beam (EBSD), deep surface imaging (DSI), and chemical mapping. In EBSD mode, users can quickly and accurately image crystal lattices of various materials, helping in the identification of different phases as well as determining preferred orientation of the microstructure. The Altura's chemical mapping modes analyze elemental composition of surfaces to evaluate the interface between different materials, a feature used for detailed analysis in composites, ceramics, and multi-layered MEMS. Through the use of DSI, the Altura offers cross-sectional imaging to study thin-film deposition and low-k dielectric structures. FEI Altura 830 is also equipped with the latest EDS detector technology, capable of providing elemental composition maps in under a minute. The detector technology is integrated with the SEM and provides users with real-time analysis. Its microchannel plate (MCP) design and integrated digital offset correction software provide superior performance, even when performing various analysis at the nanometer scale. The detector reduces loading and noise effects, leading to low detection limits and greater accuracy in trace and minor element analysis. Finally, PHILIPS Altura 830 offers a wealth of editing functions, allowing users to improve images and easily adjust focus and contrast, remove noise, combine frames, and adjust brightness and hue. The information is displayed on the monitor, so users can easily modify images to their desired specifications. In summary, Altura 830 is a scanning electron microscope specifically designed for complex metallurgical and nanoscale research. Its advanced features, such as true dual-beam capabilities, chemical mapping modes, and EDS detector technology, provide users with unprecedented precision and accuracy for research and analysis.
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