Used PHILIPS / FEI XL 855 Altura #122396 for sale

PHILIPS / FEI XL 855 Altura is a Scanning Electron Microscope (SEM) built for high throughput, high performance imaging and analysis. It offers exceptional performance for both wafer and sample imaging applications. With its advanced hardware and software, users can expect superior image resolution, fast image capture, and accurate analysis. FEI XL 855 Altura features a large 160mm chamber and the ability to accommodate tilting and rotation motion in the sample stage to improve the accuracy of the imaging and analysis. The microscope has a high-resolution, digital Retarding Field Energy Filter capable of ultra-fast imaging in phase-contrast imaging mode. Additionally, PHILIPS XL 855 Altura has an advanced optical system that features up to five-axis control and a variety of optical modes, including epi-illumination and semi-transparent back-illumination. The microscope's detectors provide superior contrast and resolution for 3D imaging, low kV imaging and ptychography. Additionally, its patented low-vacuum SE imaging mode helps to minimize sample damage and minimize image artifacts. The design also incorporates visual and predictive adaptive focus controllers, fully automated movement through multiple positions, and Imaging System Technology (IST) software for controlling image resolution, contrast, and brightness. Other features of XL 855 Altura include a CryoPrep sample loading option for cryo specimens, automated stitching of multiple images, multi-channel education mode, air-cooled/water-cooled electron columns, unlimited imaging parameters, two beam-forming optics, and an auto-calibration mode. With these features and more, users can expect superior imaging resolution and imaging accuracy. Overall, PHILIPS / FEI XL 855 Altura is an advanced Scanning Electron Microscope that offers powerful imaging, analysis and control capabilities. With its advanced digital Retarding Field Energy Filter, visual and predictive adaptive focus controllers, and IST software, users can expect superior resolution, artifacts minimization, and automated mechanics.