Used PHILIPS / FEI XL 860 #189226 for sale

ID: 189226
Dual ion beam system Electron beam: 3nm 1-30kV beam voltage Ion beam: 7nm in second electron mode, 30kV beam voltage Full digital control: Microsoft Win NT Chamber: Can handle both wafers and small samples Stage accuracy: 1.5um over 8" wafers FE-SEM with in-lens detection (2) GIS installed Oxford EDS Edward QDP dry pump.
PHILIPS / FEI XL 860 is a state-of-the-art scanning electron microscope (SEM) designed for high resolution imaging and analysis. It is equipped with a customized version of the Universal Imaging Platform (UIP) that offers superior performance and data quality. This equipment is capable of providing an array of semiconductor imaging and characterization applications including micro-structure imaging, critical dimension measurements, high resolution imaging and electron probe micro analysis (EPMA). FEI XL 860 features a wide field of view (up to 30mm), as well as a wide range of magnifications from 5x to 500,000x. This allows for high accuracy and precision in both imaging and measurement. The system is also equipped with an advanced navigation unit that provides superior control over the imaging location. This machine utilizes two identical electron columns, allowing for simultaneous imaging with both columns. PHILIPS XL 860 has an integrated energy-dispersive (ED) X-ray detector that can identify a wide range of elements. X-ray analysis can be used to determine the distribution of certain elements within a sample in addition to its composition. This enables the user to understand both physical and chemical properties of a sample. Thanks to its powerful and customizable software platform, XL 860 is also capable of supporting 3D imaging applications. 3D rendered images provide users with an unprecedented level of detail and accuracy. These images help to identify features that are not visible with conventional imaging such as fine surface features. PHILIPS / FEI XL 860 also comes with a wide variety of accessories to enhance its performance. These include a choice of lenses, focus locks, analyzers, wafers, and sample holders. The tool can also be used with a range of high-end computer hardware and peripherals to ensure optimized performance. Overall, FEI XL 860 is a powerful, versatile tool for imaging and analysis. Its advanced UIP software, multiple imaging columns, and wide range of features make it ideal for a range of SEM applications. This asset provides users with the highest level of information and control, allowing them to maximize the potential of their SEM.
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