Used ZEISS Ultra 55 #9194483 for sale

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ID: 9194483
Scanning electron microscope (SEM) High resolution mode: 20nA Oil free pumping system: XDS10 (220-240V) Operating system: Windows with keyboard Control panel USB US Vers with firmware Flange kit: 4QBSD, 55 / 55VP / UltraPlus Airlock programed, 80mm (3) Multiple single stub holder 4 Multi-purpose sample holder Faraday cup USB Dongle X-Ray / External scan input panel kit Flat panel TFT color monitor, 19" Mechanical adapter: BRUKER AXS Detectors Air compressor with auto drain THERMOCUBE 400 W, 3 lpm Gear chiller AVI-400 Extra MP active vibration isolation Field view: Fibics atlas EVO Hi-res imaging for FESEM LCD TFT Monitor: HP ZR2440w Shuttle / Find EM AV4 Mod LM-EM Site Lic.
ZEISS Ultra 55 is a scanning electron microscope (SEM) capable of producing high resolution images and extremely precise measurements on a wide range of samples. It is an effective laboratory instrument that enables users to observe, measure and analyze materials with nanometer-level accuracy. Ultra 55 is a digital imaging and analysis equipment that combines variable pressure and conventional electron micros­copy mode. It can be used to observe large area specimens in variable pressure mode, which reduces the surface charging effect. The instrument is suitable for imaging industrial and research grade semiconductor wafers and other devices, such as MEMS, bio-sensors and consumer electronics. The semiconductor mode and automatic optimization of accelerating voltage and working distance provide superior image quality with resolution as high as 0.7 nm. The system is equipped with the world-renowned twin lens technology, which enables the user to conduct high-resolution imaging in all directions. Moreover, the five-stage energy filter maximizes the signal-to-noise ratio to accurately identify and measure feature dimensions. ZEISS Ultra 55's flexible capabilities make it ideal for material characterization. The high-resolution imaging and accurate measurements are suitable for investigating composition, surface topography, defect metrology, and other features of a wide range of materials. The instrument's nanoscale capabilities make it perfect for benchmarking the lithography performance of materials. The intuitive user interface of the instrument provides shortcuts to pre-defined functions. Moreover, the unit is capable of automated image acquisition, allowing for batches of images to be taken with a single command. The unique design of Ultra 55 combines analytical and imaging capabilities into a single package for efficient and precise characterization of materials. This machine is suitable for research and industrial markets and can be easily combined with other instruments for even more capabilities.
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