Used ZEISS ZBA21 #9108115 for sale
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ID: 9108115
Wafer Size: 6"
Vintage: 1990
Electron beam lithography system, 6"
Pattern generator
Gun: LaB6
Acceleration voltage: 20 keV
Shot size: Variable shaped rectangular shape, 100×100 nm2 up to 6.3×6.3 µm2
Beam current: 1-2 A/cm2
Interferometric laser stage
Magazine loadlock chamber for (10) substrates
Substrate size: up to 7" square (photo plates)
Turbomolecular pump
Operation and maintenance manuals included
1990 vintage.
ZEISS ZBA21 is a scanning electron microscope that combines high resolution imaging and analysis with a fast and efficient process for collecting data samples. This equipment uses an electron column to create an image of a sample through the detection of electrons that are emitted from the sample in order to give a highly detailed representation of the sample's surface. ZEISS ZBA 21's high resolution imaging capabilities make it possible to observe nanometer-sized structures, which is very important for application such as the analysis of crystalline structures or the study of nanotech materials. ZBA21 scanning electron microscope is equipped with an advanced electron column design that ensures stable and reliable imaging performance. The column is equipped with several components, including a filament and a multi-lens system that help to guide and focus the electrons. This ensures that the electron image of the sample can be extremely detailed and accurate. ZBA 21 is capable of imaging a wide range of materials, including inorganic compounds, semiconductors, and biological samples. This is due to the wide range of accelerating voltage and beam current levels that can be adjusted to control the resolution of the image as well as its depth of field. ZEISS ZBA21 is also capable of working with a range of sample sizes, making it well suited for studies into the properties of small structures. ZEISS ZBA 21 offers several image acquisition modes, including scanning transmission electron microscopy, which creates an image by imaging electrons that have been transmitted through an ultrathin sample; backscattered electron imaging, which creates an image by detecting secondary electrons from the sample surface; and secondary electron imaging, which creates an image by detecting secondary electrons from the sample surfaces. This allows for a wide range of experiments and studies. ZBA21 also offers advanced data processing capabilities, allowing users to quickly analyze images to assess their samples' properties. This includes size and shape measurements, chemical composition mapping, and other analytical functions. In terms of safety, ZBA 21 unit is designed with robust shielding that minimizes the risk of exposure to secondary electrons or x-rays emitted from the sample under investigation. Additionally, the machine has a multi-level pressure control tool designed to reduce the risk of sample contamination and ensure that the microscope operates within a safe pressure range. Overall, ZEISS ZBA21 scanning electron microscope is an advanced and reliable tool that combines high resolution imaging, efficient processing, and several advanced safety features to enable a wide range of advanced sample analysis and research.
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