Used AMAT / APPLIED MATERIALS Endura II #9195097 for sale

AMAT / APPLIED MATERIALS / AKT Endura II is a powerful reactor designed for advanced deposition processes. This equipment was designed for production environments and includes high temperature processing capabilities with a wide variety of modular components. It is suitable for the deposition of thin-film materials for the production of microelectronic, optoelectronic, and biotechnological components. AKT Endura II is a two-chamber system designed for high-speed wafer transfer. This allows for faster turnaround time when depositing thin-film materials. It features an efficient thermal management unit which allows for energy savings. This machine also includes a high-powered lamp to accelerate deposition rates for high-volume production. AMAT Endura II has a maximum temperature range of up to 600°C and a pressure range of up to 5 Torr. The pump speed is variable and can be set up to 55 liters/minute. The tool also incorporates advanced software to control chamber conditions in order to ensure an optimal process. The asset includes several modular components such as a loader/unloader, a substrate cooling model, a heater control module, and a controller module that is used to send recipes and control the overall chamber conditions. This allows for electric arc, deposition, sputtering, etching, and resistive heating applications, depending on the components installed. APPLIED MATERIALS Endura II also includes a touchscreen display that will allow the user to monitor chamber conditions and status, as well as to set up the process. This display also allows for data logging. Hence, the user can monitor process performance and make adjustments when needed. Endura II is designed to allow for quick changeover and precise control over process conditions. This makes it an ideal choice for high-volume production, perfect for microelectronic, optoelectronic, and biotechnological applications. It is designed to withstand harsh environments and is easy to maintain and operate.