Used ACCUSPUTTER AW 4450 #9201786 for sale

Name: ACCUSPUTTER AW 4450
Brand: ACCUSPUTTER
SKU: 9201786
Availability: InStock

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Sputtering Systems

Manufacturer

ACCUSPUTTER

Model

AW 4450

ID: 9201786

Wafer Size: 8"

Sputtering system, 8" Wafer loading: Manual With load lock Cathodes: (3) Delta shapes / (4) Circle shapes Sputter methods: RF / DC Diode / MAGNETRON Gas lines: 1~3 MFC Options: Gas lines with MFC N2 O2 Customized Lamp tower alarm with buzzer: Mechanical pump / Dry pump for process chamber and load lock Independent mechanical pump / Dry pump for process chamber Chiller for cooling plates and table Turbo pump for load lock Load lock lamp heating function: Up to 200°C Chamber lamp heating function: Up to 300°C Plasma etch function Bias function Co sputter function Reactive sputter function Main frame 28" Diameter SST chamber top plate with ports and cathodes: Configuration I II Cathode shape Circle Delta Cathode size 8" Delta Cathode quantity 1 to 4 1 to 3 Sputter power supply: Configuration I II III DC Power 5 kW 10 kW - RF Power 1kW 2 kW 3 kW Pulse DC power 5 kW 10 kW - Process chamber: 8" Diameter x 12" High stainless steel cylinder with 6" CF Flange view port and load lock port 28" Diameter stainless steel base plate 11/2" Air operated roughing isolation valve Air operated gas inlet valve Air operated vent valve 11/2" Blanked-off leak check port Removable deposition shields 23" Diameter, 3-position water cooled annular substrate Table with variable speed motorized table drive Full circle shutter and vane shutter Chain drive pallet carrier transport Heavy duty electric hoist Load lock: 30" x 28" x 8" Stainless steel load lock chamber Aluminum cover Chain drive pallet carrier transport 2" Air operated roughing isolation valve Air operated vent valve 23" Diameter molybdenum annular substrate pallet Elevator for pallet up and down function Vacuum systems for process chamber: (2) Stage cryo pumps With 1000 l/s pumping speed for air Includes: Chevron Water cooled compressor and lines Automatic regeneration controller Plumbing kit, 71/2" Aluminum air operated gate valve: 6" ASA Air operated venetian blind throttling valve Mechanical pump or dry pump for process: 36.7 Cfm Chamber and load lock Gas line with MFC Ar, 200 SCCM, customized Power box: AC 380 V / 208 V / 3 Phase.

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ACCUSPUTTER AW 4450 is an advanced thin-film deposition equipment. This piece of industrial equipment is designed to create thin metal and dielectric layers on the surface of a wide range of substrates such as silicon wafers, wires, fibers, electronic components, and more. Using physical vapor deposition, AW 4450 produces thin films of uniform and consistent thickness in a highly efficient manner. ACCUSPUTTER AW 4450 is powered by an advanced radio frequency (RF) generator with a frequency range of 13.56 MHz or 40 kHz. This allows precise and powerful sputtering, enabling the deposition of thin films with very consistent characteristics in a highly repeatable fashion. Furthermore, the RF power is adjustable, giving the user precise control over the deposition rate and the layer thickness. AW 4450 is equipped with a high-vacuum chamber capable of reaching 1.3×10-4 Pa, an automatic vacuum setup, and turbo-pump integrated with the differentially-pumped process chamber. This allows accurate and precise control over the sputter coating process. In addition, the system can accommodate sample sizes up to 50 mm. With its HVQ polarity control, ACCUSPUTTER AW 4450 can also deposit multi-layered films with greater accuracy and control. To ensure a high-quality product, AW 4450 is equipped with advanced control and monitoring systems. This includes a process potential monitor, a substrate bias voltage monitor, and a plasma potential monitor, all of which can be monitored in real-time. In addition, the unit is equipped with a mass flow controller to make sure that the purity of the process gas is kept at a consistent level throughout the entire process. ACCUSPUTTER AW 4450 is a powerful and highly accurate sputtering machine that was designed to handle a wide range of sputtering applications. Through its precise RF power adjustment, its high-vacuum chamber, its differential pumping of the sputtering chamber, its precise control and monitoring systems, and its ability to handle sample sizes of up to 50 mm, this tool is the perfect choice for a range of industrial applications where precision and repeatability are essential.